Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves
Închide
Conţinutul numărului revistei
Articolul precedent
Articolul urmator
134 0
SM ISO690:2012
POKATILOV, Evghenii, NIKA, Denis, BALANDIN, Alexander A.. Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves. In: Applied Physics Letters, 2006, vol. 89, p. 0. ISSN 0003-6951. DOI: https://doi.org/10.1063/1.2349302
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Applied Physics Letters
Volumul 89 / 2006 / ISSN 0003-6951 /ISSNe 1077-3118

Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves

DOI:https://doi.org/10.1063/1.2349302

Pag. 0-0

Pokatilov Evghenii12, Nika Denis1, Balandin Alexander A.1
 
1 University of California, Riverside,
2 Moldova State University
 
 
Disponibil în IBN: 16 iunie 2023


Rezumat

The authors show that the electron mobility can be strongly enhanced in AlN/GaN/AlN heterostructures with the shallow In xGa 1-xN channel - nanogroove - in the middle of the potential well. The modified heterostructure has the room-temperature electron mobility, which is five times larger than that in conventional quantum wells. The maximum mobility enhancement is achieved for In content x≈0.05, which is sufficient to weaken the intersubband electron scattering without leading to the substantial electron - interface-phonon scattering. The mobility enhancement is pronounced for a wide range of the carrier densities (10 11-10 13 cm -2), which is important for GaN technology. 

Cuvinte-cheie
Aluminum nitride, Carrier concentration, Electron mobility, Electron scattering, Gallium nitride, Semiconducting indium compounds, Semiconductor quantum wells