Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves
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POKATILOV, Evghenii, NIKA, Denis, BALANDIN, Alexander A.. Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves. In: Applied Physics Letters, 2006, vol. 89, p. 0. ISSN 0003-6951. DOI: https://doi.org/10.1063/1.2349302
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Applied Physics Letters
Volumul 89 / 2006 / ISSN 0003-6951 /ISSNe 1077-3118

Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves

DOI:https://doi.org/10.1063/1.2349302

Pag. 0-0

Pokatilov Evghenii12, Nika Denis1, Balandin Alexander A.1
 
1 University of California, Riverside,
2 Moldova State University
 
 
Disponibil în IBN: 16 iunie 2023


Rezumat

The authors show that the electron mobility can be strongly enhanced in AlN/GaN/AlN heterostructures with the shallow In xGa 1-xN channel - nanogroove - in the middle of the potential well. The modified heterostructure has the room-temperature electron mobility, which is five times larger than that in conventional quantum wells. The maximum mobility enhancement is achieved for In content x≈0.05, which is sufficient to weaken the intersubband electron scattering without leading to the substantial electron - interface-phonon scattering. The mobility enhancement is pronounced for a wide range of the carrier densities (10 11-10 13 cm -2), which is important for GaN technology. 

Cuvinte-cheie
Aluminum nitride, Carrier concentration, Electron mobility, Electron scattering, Gallium nitride, Semiconducting indium compounds, Semiconductor quantum wells

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<title xml:lang='en'>Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves</title>
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<publicationYear>2006</publicationYear>
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<subject>Aluminum nitride</subject>
<subject>Carrier concentration</subject>
<subject>Electron mobility</subject>
<subject>Electron scattering</subject>
<subject>Gallium nitride</subject>
<subject>Semiconducting indium compounds</subject>
<subject>Semiconductor quantum wells</subject>
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<description xml:lang='en' descriptionType='Abstract'><p>The authors show that the electron mobility can be strongly enhanced in AlN/GaN/AlN heterostructures with the shallow In&nbsp;<sub>x</sub>Ga&nbsp;<sub>1-x</sub>N channel - nanogroove - in the middle of the potential well. The modified heterostructure has the room-temperature electron mobility, which is five times larger than that in conventional quantum wells. The maximum mobility enhancement is achieved for In content x&asymp;0.05, which is sufficient to weaken the intersubband electron scattering without leading to the substantial electron - interface-phonon scattering. The mobility enhancement is pronounced for a wide range of the carrier densities (10&nbsp;<sup>11</sup>-10&nbsp;<sup>13</sup>&nbsp;cm&nbsp;<sup>-2</sup>), which is important for GaN technology.&nbsp;</p></description>
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