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SM ISO690:2012

Surface-charge lithography for GaN microstructuring based on photoelectrochemical etching techniques

Tighineanu Ion1, Popa Veaceslav2, Volciuc Olesea3

1 Technical University of Moldova, 2 Institute of the Electronic Engineering and Nanotechnologies "D. Ghitu" of the Academy of Sciences of Moldova,

Applied Physics Letters

Nr. / 2005 / ISSN 0003-6951

Disponibil online 13 April, 2018. Descarcări-0. Vizualizări-738

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Electro- and photostimulated chemical processes in aluminium-chalcogenide glass semiconductor thin layer structures

Bivol Valeriu, Triduh Ghennadi, Achimova Elena, Ţiuleanu Dumitru

Institute of Applied Physics, Academy of Sciences of Moldova

Proceedings of the International Semiconductor Conference

Vol. 1. 1996. New Jersey. DOI 10.1109/SMICND.1996.

Disponibil online 7 December, 2023. Descarcări-0. Vizualizări-78

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Process of double-exposure interferogram formation on deformed surface of photothermoplastic media

Panasiuc Lev, Ciapurin Igor

Moldova State University

Proceedings of SPIE - The International Society for Optical Engineering

Ediția 3, Vol.2851. 1996. Bellingham, Washington. ISSN 0277-786X.

Disponibil online 8 February, 2024. Descarcări-0. Vizualizări-70

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