Photoelectric properties of GaN/GaP heterostructures
Închide
Conţinutul numărului revistei
Articolul precedent
Articolul urmator
145 0
SM ISO690:2012
BOTNARYUK, V., RAEVSKY, Simion, BELIKOV, Vasylyj, ZHILYAEV, Yurii, RUD, Yu., FEDOROV, Leonid, RUD, V.. Photoelectric properties of GaN/GaP heterostructures. In: Semiconductors, 1998, vol. 32, pp. 1077-1079. ISSN 1063-7826. DOI: https://doi.org/10.1134/1.1187571
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Semiconductors
Volumul 32 / 1998 / ISSN 1063-7826

Photoelectric properties of GaN/GaP heterostructures

DOI:https://doi.org/10.1134/1.1187571

Pag. 1077-1079

Botnaryuk V.1, Raevsky Simion1, Belikov Vasylyj2, Zhilyaev Yurii2, Rud Yu.2, Fedorov Leonid2, Rud V.3
 
1 Moldova State University,
2 Ioffe Physical-Technical Institute, RAS,
3 State Educational Institution St. Petersburg State Polytechnical University
 
 
Disponibil în IBN: 16 octombrie 2023


Rezumat

Thin interference layers of n-GaN were grown on n- and p-type GaP substrates with (100) and (111) orientations by vapor phase epitaxy in an open chloride system. Photosensitivity spectra of isotypic and anisotypic heterojunctions under linear polarized light from the side of the wideband component (GaN) at oblique incidence were investigated. Induced polarized photosensitivity was observed, and peculiarities of this photosensitivity caused by interference in the GaN layers are discussed. 

Cuvinte-cheie
photosensitivity, Polarized Radiation, photodetectors