Built-in field effect on the electron mobility in AlN/GaN/AlN quantum wells
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POKATILOV, Evghenii, NIKA, Denis, BALANDIN, Alexander A.. Built-in field effect on the electron mobility in AlN/GaN/AlN quantum wells. In: Applied Physics Letters, 2006, vol. 89, p. 0. ISSN 0003-6951. DOI: https://doi.org/10.1063/1.2349835
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Applied Physics Letters
Volumul 89 / 2006 / ISSN 0003-6951 /ISSNe 1077-3118

Built-in field effect on the electron mobility in AlN/GaN/AlN quantum wells

DOI:https://doi.org/10.1063/1.2349835

Pag. 0-0

Pokatilov Evghenii12, Nika Denis12, Balandin Alexander A.1
 
1 University of California, Riverside,
2 Moldova State University
 
 
Disponibil în IBN: 15 iunie 2023


Rezumat

The authors demonstrated theoretically that compensation of the built-in electric field in AlN/GaN/AlN heterostructures with the externally applied perpendicular electric field may lead to the increase of the in-plane electron drift mobility. It has been shown that two- to fourfold increase of the room temperature mobility can be achieved for both nondegenerate and degenerate electron densities. Their calculations clarified the role of the intersubband electron transitions mediated by optical phonons in limiting the carrier mobility in GaN-based heterostructures. The tuning of the electron mobility with the perpendicular electric field may impact design of the high-power GaN/AlGaN heterostructure field-effect transistors. 

Cuvinte-cheie
Carrier concentration, Electric field effects, Electric fields, Electron mobility, Electron transitions, Gallium nitride, Heterojunctions, phonons, Thermal effects, Tuning