Design of trapped surface charge for the photoelectrochemical fabrication of GaN mesostructures
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POPA, Veaceslav, VOLCIUC, Olesea, TIGINYANU, Ion. Design of trapped surface charge for the photoelectrochemical fabrication of GaN mesostructures. In: Physica Status Solidi (A) Applied Research, 2004, vol. 201, p. 0. ISSN 0031-8965. DOI: https://doi.org/10.1002/pssa.200409071
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Physica Status Solidi (A) Applied Research
Volumul 201 / 2004 / ISSN 0031-8965 /ISSNe 1521-396X

Design of trapped surface charge for the photoelectrochemical fabrication of GaN mesostructures

DOI:https://doi.org/10.1002/pssa.200409071

Pag. 0-0

Popa Veaceslav1, Volciuc Olesea1, Tiginyanu Ion12
 
1 Technical University of Moldova,
2 Institute of Applied Physics, Academy of Sciences of Moldova
 
 
Disponibil în IBN: 13 aprilie 2018


Rezumat

In this note we demonstrate that artificially introduced surface defects in GaN epilayers are stable against photoelectrochemical etching in aqueous solution of KOH. The origin of this stability is attributed to the negative charge trapped by the surface defects. Using 2 keV Ar ion treatment, we show that the pattern of surface defects and related trapped charge can be efficiently designed for the purpose of manufacturing GaN mesostructures.

Cuvinte-cheie
etching, Ions, Metallorganic chemical vapor deposition, Microstructure, Photoelectricity, Ultraviolet radiation