Conţinutul numărului revistei |
Articolul precedent |
Articolul urmator |
593 0 |
SM ISO690:2012 POPA, Veaceslav, VOLCIUC, Olesea, TIGINYANU, Ion. Design of trapped surface charge for the photoelectrochemical fabrication of GaN mesostructures. In: Physica Status Solidi (A) Applied Research, 2004, vol. 201, p. 0. ISSN 0031-8965. DOI: https://doi.org/10.1002/pssa.200409071 |
EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
Physica Status Solidi (A) Applied Research | ||||||
Volumul 201 / 2004 / ISSN 0031-8965 /ISSNe 1521-396X | ||||||
|
||||||
DOI:https://doi.org/10.1002/pssa.200409071 | ||||||
Pag. 0-0 | ||||||
|
||||||
Rezumat | ||||||
In this note we demonstrate that artificially introduced surface defects in GaN epilayers are stable against photoelectrochemical etching in aqueous solution of KOH. The origin of this stability is attributed to the negative charge trapped by the surface defects. Using 2 keV Ar ion treatment, we show that the pattern of surface defects and related trapped charge can be efficiently designed for the purpose of manufacturing GaN mesostructures. |
||||||
Cuvinte-cheie etching, Ions, Metallorganic chemical vapor deposition, Microstructure, Photoelectricity, Ultraviolet radiation |
||||||
|