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 SM ISO690:2012ANDRIESH, Andrei, BIVOL, Valeriu, ERSOY, Okan K., ROBU, Stephan V., SERGEEV, Sergei, VLAD, Liudmila. Both holographic and electron-beam recording in new carbazolyl - Containing photoresists. In: Proceedings of SPIE - The International Society for Optical Engineering, Ed. 7, 8-11 septembrie 2003, Constanta. Bellingham, Washington: Cavallioti, 2004, Ediţia 7, Vol.5581, pp. 543-555. ISSN 0277-786X. DOI: https://doi.org/10.1117/12.582924 |
| EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
 Proceedings of SPIE - The International Society for Optical Engineering Ediţia 7, Vol.5581, 2004 |
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Conferința "Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies" 7, Constanta, Romania, 8-11 septembrie 2003 | ||||||
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| DOI:https://doi.org/10.1117/12.582924 | ||||||
| Pag. 543-555 | ||||||
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Electron-beam and holographic recording of diffraction gratings was processed in the layers of poly-N-poxypropylcarbazole (PEPC) and co-polymers of carbazolylalkylmethacrylate with octylmethacrylate (CAM:OMA) containing additons of CHI3. The dependence of the diffraction efficiency of planar gratings on the recording current was studied. The influence of post-effect and storage in the dark on the diffraction efficiency is considered. By chemical development technique the reflecting relief diffraction gratings are obtained with the diffraction efficiency of 25-30% |
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| Cuvinte-cheie Carbazolyl, diffraction efficiency, electron beam, Grating, holography, Photoresist, polymer, recording |
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