Rapid photothermal processing for functionalization of nanostructured thin films
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SHISHIYANU, Sergiu, URSACHI, Veaceslav, GHIMPU, Lidia, LUPAN, Oleg, TIGINYANU, Ion, SHISHIYANU, Teodor. Rapid photothermal processing for functionalization of nanostructured thin films. In: Proceedings of the International Semiconductor Conference: CAS, Ed. 34, 17-19 octombrie 2011, Sinaia. New Jersey: Institute of Electrical and Electronics Engineers Inc., 2011, Vol. 2, pp. 245-248. ISBN 978-161284171-7. DOI: https://doi.org/10.1109/SMICND.2011.6095782
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Proceedings of the International Semiconductor Conference
Vol. 2, 2011
Conferința " International Semiconductor Conference"
34, Sinaia, Romania, 17-19 octombrie 2011

Rapid photothermal processing for functionalization of nanostructured thin films

DOI:https://doi.org/10.1109/SMICND.2011.6095782

Pag. 245-248

Shishiyanu Sergiu1, Ursachi Veaceslav21, Ghimpu Lidia12, Lupan Oleg1, Tiginyanu Ion13, Shishiyanu Teodor1
 
1 Technical University of Moldova,
2 Institute of Applied Physics, Academy of Sciences of Moldova,
3 Institute of Electronic Engineering and Industrial Technologies, Academy of Sciences of Moldova
 
Proiecte:
 
Disponibil în IBN: 12 decembrie 2023


Rezumat

A rapid photothermal processing (RPP) technique has been developed to functionalize a new generation of nanostructured zinc oxide film materials. An environment-friendly chemical process was used to obtain nanostructures. The post-growth RPP at 650C in N 2 atmosphere of the nanostructured zinc oxide films leads to the suppression of deep-defect-level emission, improvement of near-band edge emission and was ascribed to the decrease of the structure defects compared to the initial nanostructures. The sensitivity of the nanostructured zinc oxide films to 100 ppm ammonia for the operation temperatures between 20C and 300C was essentially improved by RPP. 

Cuvinte-cheie
Chemical growth, chemical process, Environment friendly, Functionalizations, Nano-structured, Nanostructured thin film, Near band edge emissions, Operation temperature, Rapid photothermal processing, Structure defects