Specific Features of Technology of Preparation of Bi Nanowire Arrays by Electrochemical Deposition
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2023-09-02 15:23
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GLOBA, Pavel, TSURKAN, Ana, SIDEL’NIKOVA, Svetlana. Specific Features of Technology of Preparation of Bi Nanowire Arrays by Electrochemical Deposition. In: Microelectronics and Computer Science: The 6th International Conference, Ed. 6, 1-3 octombrie 2009, Chisinau. Bălți, Republica Moldova: Universitatea de Stat „Alecu Russo" din Bălţi, 2009, Ediţia 6, pp. 511-512. ISBN 978-9975-45-122-2.
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Microelectronics and Computer Science
Ediţia 6, 2009
Conferința "Microelectronics and Computer Science"
6, Chisinau, Moldova, 1-3 octombrie 2009

Specific Features of Technology of Preparation of Bi Nanowire Arrays by Electrochemical Deposition


Pag. 511-512

Globa Pavel1, Tsurkan Ana2, Sidel’nikova Svetlana1
 
1 Institute of Applied Physics,
2 Institute of Electronic Engineering and Industrial Technologies, Academy of Sciences of Moldova
 
 
Disponibil în IBN: 17 iulie 2023


Rezumat

In this work was solved a complex of problems caused by purely electrochemical characteristics of the technology of obtaining nanowires arrays of semimetal Bi, which concerns: (i) prediction of the growth rate of layers at electrodeposition and the achievement of desired thickness for a specified time; (ii) the revealing of the nature of the growth rate restrictions, and (iii) the revealing of the conditions of electrodeposition being uniform with respect to both the layer thickness and the surface. The solution of the mentioned problems relates to the kinetics of the specific electrochemical process being the basis of nanodimensional electrodeposition.

Cuvinte-cheie
Bismuth, electrochemical deposition, kinetics process, nanowire arrays