Thermal conductivity inhibition in phonon engineered core-shell cross-section modulated Si/Ge nanowires
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NIKA, Denis, COCEMASOV, Alexandr, CRÎŞMARI, Dumitru, BALANDIN, Alexander A.. Thermal conductivity inhibition in phonon engineered core-shell cross-section modulated Si/Ge nanowires. In: Applied Physics Letters, 2013, vol. 102, p. 0. ISSN 0003-6951. DOI: https://doi.org/10.1063/1.4807389
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Applied Physics Letters
Volumul 102 / 2013 / ISSN 0003-6951

Thermal conductivity inhibition in phonon engineered core-shell cross-section modulated Si/Ge nanowires

DOI:https://doi.org/10.1063/1.4807389

Pag. 0-0

Nika Denis12, Cocemasov Alexandr2, Crîşmari Dumitru2, Balandin Alexander A.1
 
1 University of California, Riverside,
2 Moldova State University
 
 
Disponibil în IBN: 15 iunie 2023


Rezumat

We have shown theoretically that a combination of cross-section modulation and acoustic mismatch in the core-shell Si/Ge nanowires can lead to a drastic reduction of the thermal conductivity. Our calculations, which utilized two different models-five-parameter Born-von Karman and six-parameter valence force field - for the lattice vibrations, indicate that the room temperature thermal conductivity of Si/Ge cross-section modulated nanowires is almost three orders of magnitude lower than that of bulk Si. Thermal flux in the modulated nanowires is suppressed by an order of magnitude in comparison with generic Si nanowires. The effect is explained by modification of the phonon spectra in modulated nanowires leading to decrease of the phonon group velocities and localization of certain phonon modes in narrow or wide nanowire segments. The thermal conductivity inhibition is achieved in nanowires without additional surface roughness and, thus, potentially reducing degradation of the electron transport. Our results suggest that the acoustically mismatched cross-section modulated nanowires are promising candidates for thermoelectric applications. 

Cuvinte-cheie
Electron transport properties, Lattice vibrations, nanowires, phonons, Shells (structures), Silicon, surface roughness