Highly Conductive ZnO Thin Films Deposited Using CVT Ceramics as Magnetron Targets
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KOLIBABA, Gleb, RUSNAC, Dumitru, FEDOROV, Vladimir, COSTRIUCOVA, Natalia, MONAICO, Eduard, POTLOG, Tamara. Highly Conductive ZnO Thin Films Deposited Using CVT Ceramics as Magnetron Targets. In: Nanotechnologies and Biomedical Engineering, Ed. 5, 3-5 noiembrie 2021, Chişinău. Chişinău: Pontos, 2021, Ediția 5, p. 63. ISBN 978-9975-72-592-7.
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Nanotechnologies and Biomedical Engineering
Ediția 5, 2021
Conferința "Nanotechnologies and Biomedical Engineering"
5, Chişinău, Moldova, 3-5 noiembrie 2021

Highly Conductive ZnO Thin Films Deposited Using CVT Ceramics as Magnetron Targets


Pag. 63-63

Kolibaba Gleb12, Rusnac Dumitru12, Fedorov Vladimir3, Costriucova Natalia2, Monaico Eduard4, Potlog Tamara1
 
1 Moldova State University,
2 Institute of Applied Physics,
3 Institute of the Electronic Engineering and Nanotechnologies "D. Ghitu",
4 Technical University of Moldova
 
 
Disponibil în IBN: 16 noiembrie 2021


Rezumat

Sintering of ZnO+Me2O3 (Me = Al, Ga, In) powder via chemical vapor transport based on HCl has been developed. The electrical properties of ZnO thin films obtained by DC magnetron sputtering of ZnO ceramic targets have been studied. Transparency, morphology, crystallinity and crystallite size of thin films have also been investigated. ZnO:Ga thin films with a resistivity of 2.510–4 cm have been successfully obtained. The films doped with Al have lower conductivity due to weak sputtering of insoluble Al2O3 dielectric inclusions in ceramics. In the case of sintering of ZnO together with In2O3, a significant loss of the doping material is observed.