Photoelectric properties of thin GaAs epitaxial layers grown by HVPE method
Închide
Articolul precedent
Articolul urmator
311 0
SM ISO690:2012
BOTNARIUC, Tamara, GORCEAC, Leonid, COVALI, Andrei, CINIC, Boris, RAEVSKY, Simion. Photoelectric properties of thin GaAs epitaxial layers grown by HVPE method. In: Materials Science and Condensed Matter Physics, 13-17 septembrie 2010, Chișinău. Chișinău, Republica Moldova: Institutul de Fizică Aplicată, 2010, Editia 5, p. 69.
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Materials Science and Condensed Matter Physics
Editia 5, 2010
Conferința "Materials Science and Condensed Matter Physics"
Chișinău, Moldova, 13-17 septembrie 2010

Photoelectric properties of thin GaAs epitaxial layers grown by HVPE method


Pag. 69-69

Botnariuc Tamara, Gorceac Leonid, Covali Andrei, Cinic Boris, Raevsky Simion
 
Moldova State University
 
 
Disponibil în IBN: 15 aprilie 2021


Rezumat

The thin layers used for manufacturing optoelectronic devices, including solar cells based on gallium arsenide can be obtained by several methods such as chemical method of gas phase deposition (MOCVD), chemical transport reactions method (HVPE), and mlecular epitaxy. The aim of the presented work was to obtain thin epitaxial layers (d<500 nm) by HNPE method for photovoltaic devices doped with n-type (Te) and p-type (Zn) impurities within a large concentration interval of charge carriers, and to study their photoelectric properties. GaAs epitaxial layers were grown in a horizontal quartz reactor at atmospheric pressure. There was used as carrier gas the double purified hydrogen, arsenic trichloride (AsCl3) (99.9997%), Ga (99.9997%), Te, and Zn (99.997%). Epitaxial layers were grown on GaAs:Cr substrates having the (100) crystallographic orientation and disoriented by (3...5) in the direction (110). The temperatures of growth of GaAs layers in the zone of deposition and that of source are respectively (700-750)°C and (800-810)°C. The linear velocity of H2+AsCl3 flow in the zone of deposition is (30-35) cm/min. The layers were doped during the growth process in the temperature range (250..400°C of Te and Zn sources. In this temperature range at a background impurities concentration of 1015 cm-3 in the reactor, the charge carrier concentration values were (1016... 2·1019 ) cm-3 in layers doped with Te and (5·1015...1019) cm-3 for those doped with Zn. The measurements were performed at a standard installation of research of electro physical properties of semiconductor materials. The luminescent spectra were studied using the MDR-23 spectrometer. Photo luminescent excitation was performed with laser light (radiation of N2 vapours with λ = 0.337 μm) at about 3 kW pulse power and pulse duration of 10 ns. The radiation signal was recorded with the photo multiplicator ФЭУ-51 in a standard synchronous detection system. Measurements were made at liquid nitrogen temperature 77 K. In undoped layers with the concentration of charge carriers n = 1015 cm-3 the photo luminescent spectrum results in a single excitonic maximum Dx 0 bound to neutral donor with the peak at 1.509 eV. In Zn doped layers with the concentration of charge carriers p = 8·1018 cm-3 the photo luminescent spectrum has the Ax 0 maximum at 1.484 eV and corresponds to an exciton bound to neutral acceptor. For layers doped with Te having the concentration of charge carriers n = 2·1018 cm-3 there is a single maximum at 1484 eV.