Afisarea articolelor 1-1(1) pentru cuvîntul-cheie "Photoresist" , Anul: 2004
Both holographic and electron-beam recording in new carbazolyl - Containing photoresists |
Andrieş Andrei1, Bivol Valeriu1, Ersoy Okan K.2, Robu Ştefan1, Sergheev Serghei1, Vlad Ludmila1 |
Proceedings of SPIE - The International Society for Optical Engineering |
Ediţia 7, Vol.5581. 2004. Bellingham, Washington. ISSN 0277-786X. |
Disponibil online 29 January, 2024. Descarcări-0. Vizualizări-152 |
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