Low-temperature sintering of highly conductive ZnO:Ga:Cl ceramics by means of chemical vapor transport
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KOLIBABA, Gleb, RUSNAC, Dumitru, FEDOROV, Vladimir, PETRENKO, Peter A., MONAICO, Eduard. Low-temperature sintering of highly conductive ZnO:Ga:Cl ceramics by means of chemical vapor transport. In: Journal of the European Ceramic Society, 2021, nr. 1(41), pp. 443-450. ISSN 0955-2219. DOI: https://doi.org/10.1016/j.jeurceramsoc.2020.08.002
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Journal of the European Ceramic Society
Numărul 1(41) / 2021 / ISSN 0955-2219 /ISSNe 1873-619X

Low-temperature sintering of highly conductive ZnO:Ga:Cl ceramics by means of chemical vapor transport

DOI:https://doi.org/10.1016/j.jeurceramsoc.2020.08.002

Pag. 443-450

Kolibaba Gleb1, Rusnac Dumitru1, Fedorov Vladimir2, Petrenko Peter A.3, Monaico Eduard4
 
1 Moldova State University,
2 Institute of the Electronic Engineering and Nanotechnologies "D. Ghitu",
3 Institute of Applied Physics,
4 Technical University of Moldova
 
 
Disponibil în IBN: 29 noiembrie 2020


Rezumat

A new technology for sintering a ZnO + Ga2O3 powder via chemical vapor transport based on HCl has been developed. The proposed sintering method has the following advantages: a low sintering temperature of 1000–1100 °C, there is no need to use of expensive dopant nanopowders, the possibility of multiple re-sintering, and the absence of changes in the diameter of the ceramics after sintering. A ZnO:Ga:Cl ceramics with a density of 5.31 g/cm3, a hardness of 2.0 GPa, and a resistivity of 1.46 × 10–3 Ω⋅cm has been synthesized. The solubility limit of the Ga2O3 dopant has been estimated at about 3 mol %. At a higher doping level, the content of the ZnGa2O4 spinel phase becomes significant. In addition, ZnO:Ga:Cl thin films with a resistivity of 2.77 × 10–4 Ω⋅cm can be grown by DC magnetron sputtering of the synthesized ceramics.

Cuvinte-cheie
Conductive ceramics, Doping by Ga, Halide vapor transport, Highly, thin films, zinc oxide, ZnO

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<dc:creator>Colibaba, G.V.</dc:creator>
<dc:creator>Rusnac, D.</dc:creator>
<dc:creator>Fedorov, V.</dc:creator>
<dc:creator>Petrenko, P.A.</dc:creator>
<dc:creator>Monaico, E.V.</dc:creator>
<dc:date>2021-01-03</dc:date>
<dc:description xml:lang='en'><p>A new technology for sintering a ZnO + Ga<sub>2</sub>O<sub>3</sub> powder via chemical vapor transport based on HCl has been developed. The proposed sintering method has the following advantages: a low sintering temperature of 1000&ndash;1100 &deg;C, there is no need to use of expensive dopant nanopowders, the possibility of multiple re-sintering, and the absence of changes in the diameter of the ceramics after sintering. A ZnO:Ga:Cl ceramics with a density of 5.31 g/cm<sup>3</sup>, a hardness of 2.0 GPa, and a resistivity of 1.46 &times; 10<sup>&ndash;3</sup> &Omega;&sdot;cm has been synthesized. The solubility limit of the Ga<sub>2</sub>O<sub>3</sub> dopant has been estimated at about 3 mol %. At a higher doping level, the content of the ZnGa<sub>2</sub>O<sub>4</sub> spinel phase becomes significant. In addition, ZnO:Ga:Cl thin films with a resistivity of 2.77 &times; 10<sup>&ndash;4</sup> &Omega;&sdot;cm can be grown by DC magnetron sputtering of the synthesized ceramics.</p></dc:description>
<dc:identifier>10.1016/j.jeurceramsoc.2020.08.002</dc:identifier>
<dc:source>Journal of the European Ceramic Society 41 (1) 443-450</dc:source>
<dc:subject>Conductive ceramics</dc:subject>
<dc:subject>Doping by Ga</dc:subject>
<dc:subject>Halide vapor transport</dc:subject>
<dc:subject>Highly</dc:subject>
<dc:subject>thin films</dc:subject>
<dc:subject>zinc oxide</dc:subject>
<dc:subject>ZnO</dc:subject>
<dc:title>Low-temperature sintering of highly conductive ZnO:Ga:Cl ceramics by means of chemical vapor transport</dc:title>
<dc:type>info:eu-repo/semantics/article</dc:type>
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