Quenching of photodarkening in metal-doped chalcogenide amorphous films
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YOVU, M., SHUTOV, Serghei, REBEJA, S., KOLOMEYKO, Eduard, BOOLCHAND, Punit, POPESCU, Mihai A.. Quenching of photodarkening in metal-doped chalcogenide amorphous films. In: Proceedings of the International Semiconductor Conference: CAS, Ed. 25, 8-12 octombrie 2002, Sinaia. New Jersey: Institute of Electrical and Electronics Engineers Inc., 2002, Vol. 1, Ediția 25, pp. 207-210. ISBN 0780374401. DOI: https://doi.org/10.1109/SMICND.2002.1105832
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Proceedings of the International Semiconductor Conference
Vol. 1, Ediția 25, 2002
Conferința "25th International Semiconductor Conference"
25, Sinaia, Romania, 8-12 octombrie 2002

Quenching of photodarkening in metal-doped chalcogenide amorphous films

DOI:https://doi.org/10.1109/SMICND.2002.1105832

Pag. 207-210

Yovu M.1, Shutov Serghei1, Rebeja S.1, Kolomeyko Eduard1, Boolchand Punit2, Popescu Mihai A.3
 
1 Institute of Applied Physics, Academy of Sciences of Moldova,
2 University of Cincinnati,
3 National Institute of Materials Physics Bucharest-Magurele
 
 
Disponibil în IBN: 29 noiembrie 2023


Rezumat

Photodarkening relaxation under light exposure of a-As40Se60 amorphous films doped with 0.5 at.% of metals Sn, Mn, Sm, Pr or Dy and a-As50Se50 films doped up to 10.0 at.% Sn were studied for their dependence on the type and concentration of impurities and thermal treatment. Both factors reduce photodarkening with the degree of reduction dependent on the type and concentration of impurity. The relaxation process may be described by a stretched exponential with the dispersion parameter 0.4≤ α.

Cuvinte-cheie
Chalcogenide glass, Degree of reduction, Dispersion parameters, Impurity concentration, light exposure, Stretched exponential, Thermal-annealing, Time constants