Polysilicon thin layers for photovoltaic applications
Închide
Articolul precedent
Articolul urmator
170 0
SM ISO690:2012
BUDIANU, Elena, PURICA, Munitzer, RUSU, Emil, MANEA, Elena, GAVRILA, Raluca. Polysilicon thin layers for photovoltaic applications. In: Proceedings of the International Semiconductor Conference: CAS, Ed. 25, 8-12 octombrie 2002, Sinaia. New Jersey: Institute of Electrical and Electronics Engineers Inc., 2002, Vol. 1, Ediția 25, pp. 215-218. ISBN 0780374401. DOI: https://doi.org/10.1109/SMICND.2002.11058234
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Proceedings of the International Semiconductor Conference
Vol. 1, Ediția 25, 2002
Conferința "25th International Semiconductor Conference"
25, Sinaia, Romania, 8-12 octombrie 2002

Polysilicon thin layers for photovoltaic applications

DOI:https://doi.org/10.1109/SMICND.2002.11058234

Pag. 215-218

Budianu Elena1, Purica Munitzer1, Rusu Emil2, Manea Elena1, Gavrila Raluca1
 
1 National Institute for Research and Development in Microtechnologies ,
2 Institute of Applied Physics, Academy of Sciences of Moldova
 
 
Disponibil în IBN: 29 noiembrie 2023


Rezumat

Thin layers of polycrystalline silicon as the optically absorbing material for photovoltaic devices represents a promising way for simultaneously achieving of good performances and low manufacturing cost. In this paper, the preparation of polysilicon thin layers together with technological process for a p-i-n type photovoltaic cell fabrication are presented. The crystalline structure, surface morphology and optical properties were investigated by AFM technique, X-ray diffraction and spectrophotometer measurements. 

Cuvinte-cheie
manufacture, morphology, Nanocrystalline materials, optical properties, Photoelectrochemical cells, photovoltaic cells, Polycrystalline materials, Polysilicon, surface morphology, thin films