Metal-organic aerosol deposition (MAD) technique1 was shown to be very advantageous in preparation of thin films of complex functional oxides, like cuprates, manganites, titanites. Due to their unique bulk and interfacial electronic/structural properties these strongly correlated oxides are recently in the focus of fundamental and applied research. We report here further MAD developments toward the in-situ growth control via optical ellipsometry and sub-unit cell level composition control of films and superlattices by deposition of atomic layers. Formation of Ruddlesden-Popper SrO(SrTiO3)n thin films with n = 4 will be presented as a direct demonstration of the atomic layer-by-layer deposition. The results on the structure and magnetotransport of individual atomic layer-by-layer grown thin films (LMO, LBMO, LSMO) as well as of superlattices (LCMO/PCMO, LBMO/LMO, LCMO/BTO) will be presented and discussed with the main focus on the optimization of colossal magnetoresistance and artificial multiferroic behavior by means of electronic and/or structural interface engineering. Financial support from EU FP 7 IFOX (interfacing oxides) and STCU project 5390 is acknowledged. [1] Appl. Phys. Lett. 74, 1842 (1999).