Articolul precedent |
Articolul urmator |
771 11 |
Ultima descărcare din IBN: 2020-04-18 13:54 |
SM ISO690:2012 BOROICA, Lucica, SAVA, Bogdan Alexandru, ŞIKIMAKA, Olga, GRABCO, Daria, ELIŞA, Mihail, IORDANESCU, Raluca, MONTEIRO, Regina C C., MEDIANU, R.V.. Magnetron sputtering multistrate thin layers deposition from doped boron-phosphate systems. In: Materials Science and Condensed Matter Physics, Ed. 8-th Edition, 12-16 septembrie 2016, Chişinău. Chişinău: Institutul de Fizică Aplicată, 2016, Editia 8, p. 127. ISBN 978-9975-9787-1-2. |
EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
Materials Science and Condensed Matter Physics Editia 8, 2016 |
|
Conferința "International Conference on Materials Science and Condensed Matter Physics" 8-th Edition, Chişinău, Moldova, 12-16 septembrie 2016 | |
|
|
Pag. 127-127 | |
Descarcă PDF | |
Rezumat | |
The experiments for the deposition of very thin films were realized on a RF magnetron sputtering device, ions tune assisted, VARIAN ER 3119 type. The boron-phosphate and boro-silica glass substrates were positioned in the reaction chamber at 100 mm from magnetron cathode. An Ag 99.99% target was positioned near the other magnetron. The Ag layer was made in controlled atmosphere Ar 99.99%, at a flow rate of 25 s.c.cm and partial pressure 4,5 x 10-4 torr. The evaporation rate was constant 0.5 Ǻ/s – 0.9 Ǻ/s. The layer thickness on monitor was 3 nm + 0.5 nm. By fine control of Ag surface morphology deposed (with ion energies <1500 eV) increased the resolution of details to 30 nm. Using Quantum Efficiency Measurement System QE 1400 the transmission in visible domain was measured. In the 400 nm – 500 nm domains at 480 nm the negative refraction index appears. We point out that for a layer of 3 nm + 0.5 nm thickness a transmission reduction by 35-40% cannot appear in the visible domain. Ellipsometry measurements are presented in fig. 1. The AFM investigation made on a PARK XE100 apparatus confirm that the thickness of the layer is in concordance with the in situ monitoring deposition device data. The tendency to self-organization can be observed on small areas of 20µm x 20µm (fig. 2). Acknowledgements: To the UEFISCDI Romania, for the financial support in the frame of 7081/2013 M-ERA.NET project, 186/2012 project PNII and Bilateral Romanian-Moldovian project 695/2013 and 13.820.05.20/RoF/2013 and to FCT (Foundation for Science and Technology), Portugal, for financing M-ERA.NET/0010/2012 and UID/CTM/500025/2013.proje |
|
|
Dublin Core Export
<?xml version='1.0' encoding='utf-8'?> <oai_dc:dc xmlns:dc='http://purl.org/dc/elements/1.1/' xmlns:oai_dc='http://www.openarchives.org/OAI/2.0/oai_dc/' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xsi:schemaLocation='http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd'> <dc:creator>Boroica, L.</dc:creator> <dc:creator>Sava, B.</dc:creator> <dc:creator>Şikimaka, O.A.</dc:creator> <dc:creator>Grabco, D.Z.</dc:creator> <dc:creator>Elişa, M.</dc:creator> <dc:creator>Iordanescu, R.</dc:creator> <dc:creator>Monteiro, R.</dc:creator> <dc:creator>Medianu, R.</dc:creator> <dc:date>2016</dc:date> <dc:description xml:lang='en'><p>The experiments for the deposition of very thin films were realized on a RF magnetron sputtering device, ions tune assisted, VARIAN ER 3119 type. The boron-phosphate and boro-silica glass substrates were positioned in the reaction chamber at 100 mm from magnetron cathode. An Ag 99.99% target was positioned near the other magnetron. The Ag layer was made in controlled atmosphere Ar 99.99%, at a flow rate of 25 s.c.cm and partial pressure 4,5 x 10-4 torr. The evaporation rate was constant 0.5 Ǻ/s – 0.9 Ǻ/s. The layer thickness on monitor was 3 nm + 0.5 nm. By fine control of Ag surface morphology deposed (with ion energies <1500 eV) increased the resolution of details to 30 nm. Using Quantum Efficiency Measurement System QE 1400 the transmission in visible domain was measured. In the 400 nm – 500 nm domains at 480 nm the negative refraction index appears. We point out that for a layer of 3 nm + 0.5 nm thickness a transmission reduction by 35-40% cannot appear in the visible domain. Ellipsometry measurements are presented in fig. 1. The AFM investigation made on a PARK XE100 apparatus confirm that the thickness of the layer is in concordance with the in situ monitoring deposition device data. The tendency to self-organization can be observed on small areas of 20µm x 20µm (fig. 2). Acknowledgements: To the UEFISCDI Romania, for the financial support in the frame of 7081/2013 M-ERA.NET project, 186/2012 project PNII and Bilateral Romanian-Moldovian project 695/2013 and 13.820.05.20/RoF/2013 and to FCT (Foundation for Science and Technology), Portugal, for financing M-ERA.NET/0010/2012 and UID/CTM/500025/2013.proje</p></dc:description> <dc:source>Materials Science and Condensed Matter Physics (Editia 8) 127-127</dc:source> <dc:title>Magnetron sputtering multistrate thin layers deposition from doped boron-phosphate systems</dc:title> <dc:type>info:eu-repo/semantics/article</dc:type> </oai_dc:dc>