Surface modification of Ti by chemical etching and HA sputtering for dental applications

Baytekin M.; Gerngross Mark Daniel; Li Q.; Viebig S.; Selhuber-Unkel C.; Carstensen Juergen; Foll Helmut; Adelung Rainer

Articolul precedent

Articolul urmator

642

SM ISO690:2012

BAYTEKIN, M., GERNGROSS, Mark Daniel, LI, Q., VIEBIG, S., SELHUBER-UNKEL, C., CARSTENSEN, Juergen, FOLL, Helmut, ADELUNG, Rainer. Surface modification of Ti by chemical etching and HA sputtering for dental applications. In: Nanotechnologies and Biomedical Engineering, Ed. 2, 18-20 aprilie 2013, Chișinău. Technical University of Moldova, 2013, Editia 2, pp. 56-59. ISBN 978-9975-62-343-8..

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Nanotechnologies and Biomedical Engineering
Editia 2, 2013

Conferința "International Conference on Nanotechnologies and Biomedical Engineering"
2, Chișinău, Moldova, 18-20 aprilie 2013

Surface modification of Ti by chemical etching and HA sputtering for dental applications

Pag. 56-59

Baytekin M., Gerngross Mark Daniel, Li Q., Viebig S., Selhuber-Unkel C., Carstensen Juergen, Foll Helmut, Adelung Rainer

Institute for Material Science, Christian-Albrechts-University of Kiel

Disponibil în IBN: 14 iunie 2019

Rezumat

This work presents the surface modifications obtained in a two-step chemical etching process consisting of chemical etching and subsequent post etching. The additional post-etching results in an increased cell proliferation of almost 50% compared to the non-post-etched. An additional hydroxyapatite coating (about 160 nm thickness) is highly beneficial to further increase the cell adhesion on the etched Ti surface.

Cuvinte-cheie
Titanium, chemical etching, post-etching hydroxyapatite, cell adhesion

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