Ultra-thin GaN membranes fabricated by using surface charge lithography
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TIGINYANU, Ion, POPA, Veaceslav, STEVENS-KALCEFF, Marion A.. Ultra-thin GaN membranes fabricated by using surface charge lithography. In: ECS Transactions, Ed. 6, 1-6 mai 2011, Montreal. Pennington, New Jersey: Electrochemical Society Inc., 2012, Vol. 35, Ediția 6, pp. 13-19. ISBN 978-160768217-2, 978-156677867-1. ISSN 19385862. DOI: https://doi.org/10.1149/1.3570841
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ECS Transactions
Vol. 35, Ediția 6, 2012
Simpozionul "ECS Transactions"
6, Montreal, Canada, 1-6 mai 2011

Ultra-thin GaN membranes fabricated by using surface charge lithography

DOI:https://doi.org/10.1149/1.3570841

Pag. 13-19

Tiginyanu Ion12, Popa Veaceslav2, Stevens-Kalceff Marion A.3
 
1 Institute of Electronic Engineering and Industrial Technologies, Academy of Sciences of Moldova,
2 Technical University of Moldova,
3 University of New South Wales
 
 
Disponibil în IBN: 30 ianuarie 2024


Rezumat

We report on fabrication of ultra-thin GaN membranes of nanometer scale thickness, by using the concept of surface charge lithography based on low-energy ion treatment of the sample surface with subsequent photoelectrochemical etching. The membranes prove to be transparent to both electrons and UV radiation, emit mainly yellow cathodoluminescence, and exhibit electrical conductivity. Successful fabrication of nanometer-thin membranes opens unique possibilities for exploration of two dimensional GaN-based structures predicted to be ferromagnetic with defect-induced half-metallic configuration which is of peculiar importance for spintronics applications. 

Cuvinte-cheie
electrical conductivity, Gan membranes, GaN-based structures, Nano-meter scale, Photo-electrochemical etching, Sample surface, Spintronics application, Surface charge lithography