Properties of 2D and 3D dielectric structures fabricated by electrochemical dissolution of III-V compounds
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TIGINYANU, Ion, LANGA, Sergiu, CHRISTOPHERSEN, Marc, CARSTENSEN, Juergen, SERGENTU, Vladimir, FOCA, Eugen, AUTOR, Nou, FOLL, Helmut. Properties of 2D and 3D dielectric structures fabricated by electrochemical dissolution of III-V compounds. In: Materials Research Society Symposium - Proceedings, Ed. 1, 26-29 noiembrie 2001, Boston. Warrendale, Pennsylvania: Materials Research Society, 2002, Vol. 692, pp. 663-668. ISSN 02729172.
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Materials Research Society Symposium - Proceedings
Vol. 692, 2002
Simpozionul "Progress in Semiconductor Materials for Optoelectronic Applications"
1, Boston, Statele Unite ale Americii, 26-29 noiembrie 2001

Properties of 2D and 3D dielectric structures fabricated by electrochemical dissolution of III-V compounds


Pag. 663-668

Tiginyanu Ion1, Langa Sergiu1, Christophersen Marc1, Carstensen Juergen1, Sergentu Vladimir2, Foca Eugen2, Autor Nou1, Foll Helmut1
 
1 Technical University of Moldova,
2 Christian-Albrechts University of Kiel
 
 
Disponibil în IBN: 22 ianuarie 2024


Rezumat

Porous layers and membranes representing 2D and 3D dielectric structures were fabricated on different III-V compounds (GaAs, InP, GaP) by electrochemical etching techniques. Nonlithographically fabricated ordered nanopore arrays in InP are reported for the first time. We show that the reflectance from nanostructured ImP is lower than that from bulk InP in the spectral interval 1.5-2.2 eV. The artificial anisotropy induced by nanotexturization was studied in porous Gap membranes and the refractive indices for ordinary and extraordinary beams were evaluated.

Cuvinte-cheie
Anisotropy, dissolution, electrochemistry, morphology, Nanostructured materials, Nonlinear optics, porosity, reflection, refractive index, scanning electron microscopy, Semiconducting gallium arsenide, Semiconducting indium phosphide