Formation of tetrahedron-like pores during anodic etching of (100) oriented n-GaAs
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LANGA, Sergiu, CARSTENSEN, Juergen, TIGINYANU, Ion, CHRISTOPHERSEN, Marc, FOLL, Helmut. Formation of tetrahedron-like pores during anodic etching of (100) oriented n-GaAs. In: Electrochemical and Solid-State Letters, 2002, vol. 5, pp. 14-17. ISSN 1099-0062. DOI: https://doi.org/10.1149/1.1423803
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Electrochemical and Solid-State Letters
Volumul 5 / 2002 / ISSN 1099-0062

Formation of tetrahedron-like pores during anodic etching of (100) oriented n-GaAs

DOI:https://doi.org/10.1149/1.1423803

Pag. 14-17

Langa Sergiu1, Carstensen Juergen1, Tiginyanu Ion23, Christophersen Marc1, Foll Helmut1
 
1 Christian-Albrechts University of Kiel,
2 Institute of Applied Physics, Academy of Sciences of Moldova,
3 Technical University of Moldova
 
 
Disponibil în IBN: 16 ianuarie 2024


Rezumat

The morphology of porous layers obtained by electrochemical etching of (100) oriented n-GaAs substrates in an aqueous solution of HCl was studied. At low anodic current densities, up to 5 mA/cm2, pores in the form of triangular prisms grew along [removed] crystallographic directions. For larger current densities the shape of the pores did not suffer any changes at the beginning of the process, while after a definite period of time the morphology of pores changed drastically to chains of tetrahedral voids with {111} facets.

Cuvinte-cheie
Crystal growth, Crystal orientation, crystal structure, current density, electrochemistry, etching, hydrochloric acid, morphology, porosity, scanning electron microscopy, Substrates