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 SM ISO690:2012ENAKI, Nicolae. Lithographic limit and problems of two-photon holograms in quantum optics. In: Proceedings of SPIE - The International Society for Optical Engineering, Ed. 5, 26-29 august 2010, Constanta. Bellingham, Washington: SPIE, 2010, Ediţia 5, Vol.7821, pp. 1-10. ISBN 9780819483300 . ISSN 0277-786X. DOI: https://doi.org/10.1117/12.882268 |
| EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
 Proceedings of SPIE - The International Society for Optical Engineering Ediţia 5, Vol.7821, 2010 |
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Conferința "Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies" 5, Constanta, Romania, 26-29 august 2010 | ||||||
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| DOI:https://doi.org/10.1117/12.882268 | ||||||
| Pag. 1-10 | ||||||
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The application of coherence proprieties of bimodal field in quantum lithography and quantum holography is proposed. The coherence effect between the photons from Stokes and anti-Stokes waves generated in Raman lasing emission is established. The application of Stokes and anti-Stokes bimodal coherent field in lithography and holography are given in according with the definition of amplitude and phase of such entangled states of light. The optical scheme of holographic representation of object in bimodal representation is proposed. |
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| Cuvinte-cheie Entanglement states, Lithography, non-liner optics, Quantum holography, Quantum optics |
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Cerif XML Export
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