Porosity-induced modification of the phonon spectrum of n-GaAs
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TIGINYANU, Ion, IRMER, Gert, MONECKE, Jochen, VOGT, Alexander, HARTNAGEL, Hans Ludwig. Porosity-induced modification of the phonon spectrum of n-GaAs. In: Semiconductor Science and Technology, 1997, vol. 12, pp. 491-493. ISSN 0268-1242. DOI: https://doi.org/10.1088/0268-1242/12/4/001
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Semiconductor Science and Technology
Volumul 12 / 1997 / ISSN 0268-1242

Porosity-induced modification of the phonon spectrum of n-GaAs

DOI:https://doi.org/10.1088/0268-1242/12/4/001

Pag. 491-493

Tiginyanu Ion12, Irmer Gert3, Monecke Jochen3, Vogt Alexander1, Hartnagel Hans Ludwig1
 
1 Technical University Darmstadt,
2 Institute of Applied Physics, Academy of Sciences of Moldova,
3 Institut für Theoretische Physik, TU Bergakademie Freiberg
 
 
Disponibil în IBN: 31 august 2023


Rezumat

Porous GaAs layers have been produced by anodic etching of (100)-oriented crystalline substrates in a H2SO4 solution. Scanning electron microscope images showed the formation of submicron pores, the average dimension of the remaining GaAs walls being of about 100 nm. Raman scattering by LO-phonon-plasmon coupled modes, inherent in as-grown crystals, was not observed in the porous layers. Proposed explanations are either the depletion of the GaAs skeleton due to the surface space-charge effect or the decoupling of the LO-phonon and the plasmon modes at the relative large wavevectors transferred in nanostructures. A new Raman scattering peak at 275 cm-1, located between the bulk TO and LO frequencies, has been observed in porous layers and attributed to a surface-related phonon.

Cuvinte-cheie
Crystal growth, Crystal orientation, etching, Nanostructured materials, phonons, porosity, porous materials, Raman scattering, scanning electron microscopy, Substrates, sulfuric acid

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<dc:creator>Tighineanu, I.M.</dc:creator>
<dc:creator>Irmer, G.</dc:creator>
<dc:creator>Monecke, J.</dc:creator>
<dc:creator>Vogt, A.</dc:creator>
<dc:creator>Hartnagel, H.</dc:creator>
<dc:date>1997-04-01</dc:date>
<dc:description xml:lang='en'><p>Porous GaAs layers have been produced by anodic etching of (100)-oriented crystalline substrates in a H<sub>2</sub>SO<sub>4</sub>&nbsp;solution. Scanning electron microscope images showed the formation of submicron pores, the average dimension of the remaining GaAs walls being of about 100 nm. Raman scattering by LO-phonon-plasmon coupled modes, inherent in as-grown crystals, was not observed in the porous layers. Proposed explanations are either the depletion of the GaAs skeleton due to the surface space-charge effect or the decoupling of the LO-phonon and the plasmon modes at the relative large wavevectors transferred in nanostructures. A new Raman scattering peak at 275 cm<sup>-1</sup>, located between the bulk TO and LO frequencies, has been observed in porous layers and attributed to a surface-related phonon.</p></dc:description>
<dc:identifier>10.1088/0268-1242/12/4/001</dc:identifier>
<dc:source>Semiconductor Science and Technology  () 491-493</dc:source>
<dc:subject>Crystal growth</dc:subject>
<dc:subject>Crystal orientation</dc:subject>
<dc:subject>etching</dc:subject>
<dc:subject>Nanostructured materials</dc:subject>
<dc:subject>phonons</dc:subject>
<dc:subject>porosity</dc:subject>
<dc:subject>porous materials</dc:subject>
<dc:subject>Raman scattering</dc:subject>
<dc:subject>scanning electron microscopy</dc:subject>
<dc:subject>Substrates</dc:subject>
<dc:subject>sulfuric acid</dc:subject>
<dc:title>Porosity-induced modification of the phonon spectrum of n-GaAs</dc:title>
<dc:type>info:eu-repo/semantics/article</dc:type>
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