Peculiarities of ultrathin amorphous and nanostructured te thin films by gas sensing
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TSIULYANU , Dumitru, MOCREAC, Olga, CIOBANU, Marina, ENACHI, Mihail, VOLODINA, Galina. Peculiarities of ultrathin amorphous and nanostructured te thin films by gas sensing. In: Journal of Nanoelectronics and Optoelectronics, 2014, vol. 9, pp. 282-286. ISSN 1555-130X. DOI: https://doi.org/10.1166/jno.2014.1585
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Journal of Nanoelectronics and Optoelectronics
Volumul 9 / 2014 / ISSN 1555-130X

Peculiarities of ultrathin amorphous and nanostructured te thin films by gas sensing

DOI:https://doi.org/10.1166/jno.2014.1585
CZU: 538.975+621.38

Pag. 282-286

Tsiulyanu Dumitru1, Mocreac Olga1, Ciobanu Marina1, Enachi Mihail1, Volodina Galina2
 
1 Technical University of Moldova,
2 Institute of Applied Physics, Academy of Sciences of Moldova
 
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Disponibil în IBN: 28 august 2023


Rezumat

The extinction of sensitivity to nitrogen dioxide induced by high gas concentration have been observed in ultrathin tellurium films. The phenomenon becomes apparent in both continuous and nanostructured films shown by AFM, SEM and XRD analyses to be in amorphous state. Sensitivity of 30 nm thick Te film decreases near linearly with concentration increase between 150 and 500 ppb of the nitrogen dioxide. The results are explained in terms of formation of a nitrogen dioxide catalytic gate in which a molecule adsorbs (and desorbs) without reacting

Cuvinte-cheie
Amorphous Tellurium, Extinction, gas sensing, Nanostructured tellurium, nitrogen dioxide, Ultrathin films