Synthesis of nanolayers hydroxo-(Sn x O y H z ) and heteropoly-(H x PW y O z ) compounds of hybrid-type on silica surfaces by successive ionic layer deposition method
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TOLSTOY, Valeri, GULINA, Larisa, KOROTCHENKOV, Ghenadii, BRYNZARI, Vladimir. Synthesis of nanolayers hydroxo-(Sn x O y H z ) and heteropoly-(H x PW y O z ) compounds of hybrid-type on silica surfaces by successive ionic layer deposition method. In: Applied Surface Science, 2004, vol. 221, pp. 197-202. ISSN 0169-4332. DOI: https://doi.org/10.1016/S0169-4332(03)00880-8
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Applied Surface Science
Volumul 221 / 2004 / ISSN 0169-4332

Synthesis of nanolayers hydroxo-(Sn x O y H z ) and heteropoly-(H x PW y O z ) compounds of hybrid-type on silica surfaces by successive ionic layer deposition method

DOI:https://doi.org/10.1016/S0169-4332(03)00880-8

Pag. 197-202

Tolstoy Valeri1, Gulina Larisa1, Korotchenkov Ghenadii2, Brynzari Vladimir2
 
1 St Petersburg University,
2 Technical University of Moldova
 
 
Disponibil în IBN: 14 iulie 2023


Rezumat

We determined the synthesis conditions for successive ionic layer deposition of the Sn 16 (OH) x PW 19 O y ·nH 2 O nanolayers on silica surfaces. The synthesized layers were characterized using UV-Vis and FTIR absorption spectroscopies, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). On heating the as-synthesized layers to 200-500 °C in air, incorporated water evaporate, while M-OH groups are condensed and concentration of the W-O-W and W-O-Sn bonds increase. The layers have amorphous agglomerate-like structure. The agglomerate size is from 20 to 100 nm. Upon heating to 600 °C, the size insignificantly increases, the agglomerate form being practically unchanged. The data obtained allow conclusion that the layers present a hybrid compound consisting of fragments of isopoly-(Sn x O y H z ) and heteropoly-(H x PW y O z ) compounds

Cuvinte-cheie
Heteropoly-oxometalate (H x PW y O z ), Hydroxo-(Sn x O y H z ), Successive ionic layer deposition method