Heterojunction with ZnO polycrystalline thin films for optoelectronic devices applications
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PURICA, Munitzer, BUDIANU, Elena, RUSU, Emil. Heterojunction with ZnO polycrystalline thin films for optoelectronic devices applications. In: Microelectronic Engineering, 2000, vol. 51, pp. 425-431. ISSN -. DOI: https://doi.org/10.1016/S0167-9317(99)00492-X
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Microelectronic Engineering
Volumul 51 / 2000 / ISSN - /ISSNe 0167-9317

Heterojunction with ZnO polycrystalline thin films for optoelectronic devices applications

DOI:https://doi.org/10.1016/S0167-9317(99)00492-X

Pag. 425-431

Purica Munitzer1, Budianu Elena1, Rusu Emil2
 
1 National Institute for Research and Development in Microtechnology, IMT-Bucharest,
2 Institute of Applied Physics, Academy of Sciences of Moldova
 
 
Disponibil în IBN: 30 iunie 2023


Rezumat

Thin films of ZnO were deposited by thermal decomposition of Zn(C5H7O2)2 on semiconductor substrate, n-type silicon, p-type InP and also on transparent glass substrate. The obtained ZnO/Si and ZnO/InP heterostructures were investigated for optical properties by spectrophotometry and surface morphology by AFM. The measured values of optoelectrical parameters in the visible spectral range and the lateral photovoltage characteristics demonstrate the possibility of using ZnO/n-Si and ZnO/p-InP heterojunctions for photodetection and photovoltaic devices applications.

Cuvinte-cheie
Engineering controlled terms Heterojunctions, morphology, photodetectors, Polycrystalline materials, pyrolysis, Semiconducting glass, Semiconducting indium phosphide, Semiconducting silicon, spectrophotometry, Substrates, surfaces, Zinc oxide Engineering uncontrolled terms Glass substrate, Photovoltaic devices, Semiconductor substrate Engineering main heading Thin films