Numeric modeling and analytical solution of ionizing irradiation induced charge in MOSFET structure oxide
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RUSANOVSCHI, Vitalie, AVRAM, Adrian Adrian. Numeric modeling and analytical solution of ionizing irradiation induced charge in MOSFET structure oxide. In: Symposium on Electronics and Telecommunications: ISETC 2014, Ed. 11, 14-15 noiembrie 2014, Timisoara. New Jersey: Institute of Electrical and Electronics Engineers Inc., 2015, Ediția 11, p. 0. ISBN 978-147997265-4. DOI: https://doi.org/10.1109/ISETC.2014.7010739
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Symposium on Electronics and Telecommunications
Ediția 11, 2015
Simpozionul "11th International Symposium on Electronics and Telecommunications"
11, Timisoara, Romania, 14-15 noiembrie 2014

Numeric modeling and analytical solution of ionizing irradiation induced charge in MOSFET structure oxide

DOI:https://doi.org/10.1109/ISETC.2014.7010739

Pag. 0-0

Rusanovschi Vitalie1, Avram Adrian Adrian2
 
1 State Agency on Intellectual Property of the Republic of Moldova ,
2 Politehnica University of Timisoara
 
 
Disponibil în IBN: 2 iunie 2023


Rezumat

Generally, numeric modeling of induced charge MOS oxide is hard to determine. The main problems that appear consist in difficulty of verifying the results of calculation errors due to mathematical modeling. In this paper is proposed a method to solve the system equation that describes charge induced in MOS structures under ionizing irradiation process.

Cuvinte-cheie
Charge accumulation, Ionizing irradiation, modeling, MOS structures