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Monte Carlo simulations"
The impact of the discreteness of low-fluence ion beam processing on the spatial architecture of GaN nanostructures fabricated by surface charge lithography |
Tighineanu Ion1, Volciuc Olesea2, Stevens-Kalceff Marion A.3, Popa Veaceslav4, Gutowski Jurgen2, Wille Sebastian5, Adelung Rainer5, Foll Helmut5 |
1 Institute of the Electronic Engineering and Nanotechnologies "D. Ghitu" of the Academy of Sciences of Moldova, 4 Technical University of Moldova,
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Surface Engineering and Applied Electrochemistry |
Nr. 1(49) / 2013 / ISSN 1068-3755 /ISSNe 1934-8002 |
Disponibil online 23 March, 2018. Descarcări-1. Vizualizări-779 |
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