To realize an imaging system with subwavelength resolution without scanning or post-processing, plasmonic superlens for far field subwavelength imaging was suggested [1-3]. Recently, we have numerically demonstrated subwavelength imaging of a cascaded plasmonic superlens [4]. In this paper, we will report on the fabrication procedure of the lens and demonstrate the imaging property of the fabricated structure.     As shown in Figure 1(a), the cascaded superlens is composed of two parts: a double layer meander cavity structure (DLMC) used for coupling and supporting the propagation of evanescent waves and a planar plasmonic lens (PPL) used for transferring waves into free space with magnification. A double-slit structure is used as a test object, which is located below the cascaded lens structure and will be first fabricated.   Before fabricating the whole lens, each part of the cascaded structure is fabricated separately to optimize the fabrication parameters. The optical property of each fabricated part is also characterized to ensure that each behaves as is designed. Then the whole cascaded lens is fabricated together. An SEM cross-section image of the fabricated lens is shown in Figure 1(b). Figure 1(c) shows the calculated far field intensity distribution in the x-z plane using the fabricated structural parameters. Observed under a microscope with NA = 1, magnified image of the double-slit behind the cascaded structure can be obtained. The image in the xy-plane positioned at a z-position shown by the dashed line in (c) was measured by a CCD camera (Figure 1(d)). Comparing the measured field with the calculated one as shown in Figure 1(e), we see that very good agreement is obtained. These results pave further the way for precise nano-fabrications and characterizations.