Using the method of determination of throwing power (TP) of electrolyte for chromium plating in cell like Hull cell with a motionless cylindrical electrode we demonstrated that use of pulse deposition (duty cycle = 0.25, pulse = 2 s) allows to obtain values of TP  90% unlike electrodeposition at direct current, at which TP is negative. In spite of the fact, that at use of the given method of TP determination the current efficiency decreases at direct current (obviously, due to additional heat evolution), it is higher under investigated pulse conditions, than at direct current. Comparison of experimentally determined values of rate distribution with modelling calculations within the framework of an initial current distribution and experimentally measured dependence of current efficiency on current density (i) demonstrates, that the divergence in the field of high i is connected with additional surface heat evolution, and also with dimensional effect (mentioned in earlier articles) at chromium plating with high current density.