Ultra-thin semiconductor membrane nanotechnology based on surface charge lithography
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TIGINYANU, Ion, POPA, Veaceslav, STEVENS-KALCEFF, Marion A.. Ultra-thin semiconductor membrane nanotechnology based on surface charge lithography. In: Proceedings of SPIE - The International Society for Optical Engineering, Ed. 5, 18-20 aprilie 2011, Prague. Bellingham, Washington: SPIE, 2011, Ediţia 5, Vol.8068, pp. 1-7. ISBN 978-081948657-8. ISSN 0277786X. DOI: https://doi.org/10.1117/12.890125
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Proceedings of SPIE - The International Society for Optical Engineering
Ediţia 5, Vol.8068, 2011
Conferința "Bioelectronics, Biomedical, and Bioinspired Systems V; and Nanotechnology V"
5, Prague, Cehia, 18-20 aprilie 2011

Ultra-thin semiconductor membrane nanotechnology based on surface charge lithography

DOI:https://doi.org/10.1117/12.890125

Pag. 1-7

Tiginyanu Ion1, Popa Veaceslav2, Stevens-Kalceff Marion A.3
 
1 Institute of Electronic Engineering and Industrial Technologies, Academy of Sciences of Moldova,
2 Technical University of Moldova,
3 University of New South Wales
 
Proiecte:
 
Disponibil în IBN: 29 noiembrie 2023


Rezumat

We show that by subjecting GaN epilayers on sapphire substrates to low-energy/low-dose ion treatment with subsequent photoelectrochemical etching it is possible to fabricate ultra-thin GaN membranes in the form of nano-roof hanging over networks of whiskers representing threading dislocations. The suspended membranes prove to be transparent to both UV-radiation and keV-energy electrons, their architecture being dependent upon the stirring conditions of the electrolyte during electrochemical etching. The obtained results are indicative of electrical conductivity, flexibility and excellent mechanical stability of ultra-thin GaN membranes characterized by prevailing yellow cathodoluminescence. 

Cuvinte-cheie
GaN, Ion beam treatment, nanostructuring, Photoelectrochemical etching, Surface charge lithography, Ultra-thin membranes