MSP 4 P Study of the deposition of titanium carbonitride by reactive RF sputtering
Close
Articolul precedent
Articolul urmator
480 0
SM ISO690:2012
SAOULA, N., TAZEROUT, M., SHRIVASTAVA, S., ERASMUS, R.M., COMINS, J.D.. MSP 4 P Study of the deposition of titanium carbonitride by reactive RF sputtering. In: Materials Science and Condensed Matter Physics, Ed. 6, 11-14 septembrie 2012, Chișinău. Chișinău, Republica Moldova: Institutul de Fizică Aplicată, 2012, Editia 6, p. 80. ISBN 978-9975-66-290-1.
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Materials Science and Condensed Matter Physics
Editia 6, 2012
Conferința "Materials Science and Condensed Matter Physics"
6, Chișinău, Moldova, 11-14 septembrie 2012

MSP 4 P Study of the deposition of titanium carbonitride by reactive RF sputtering


Pag. 80-80

Saoula N.1, Tazerout M.1, Shrivastava S.2, Erasmus R.M.2, Comins J.D.2
 
1 CDTA, Plasma Discharges Group, DMIL,
2 School of Physics, University of the Witwatersrand
 
 
Disponibil în IBN: 12 martie 2020


Rezumat

In recent years, significant attention of the researchers is given to multicomponent interstitial compounds of titanium (carbonitrides, carboxides, and oxynitrides). This is explained by the fact that their physicomechanical properties are better than the properties of binary compounds [1]. Titanium carbonitride (TiCN) coatings are very interesting coatings that combine the high hardness and low friction coefficient of the TiC phases and the high toughness of the TiN phases [27]. These unique properties make TiCN coatings a good solution for the applications requiring high abrasion and wear resistance. The deposition of TiCN coatings by sputtering has important specific advantages such as low levels of impurities and easy control of deposition rate. This method also enables the production of thin coatings of various morphology and crystallographic structure.When a sputtering technique is used for depositing TiCN coatings, the coatings properties are widely changed by the variation of the sputtering conditions, such as reactive gas pressure, total pressure, and substrate bias voltage. Therefore, it is interesting to study the effects of the deposition parameters on TiCN coatings. In this work, Ti(C,N) coating have been deposited by RF reactive magnetron sputtering (13.56 MHz). We’ve been studied the effect of the nitrogen partial pressure and the substrate bias voltage on the properties of titanium carbonitride coatings prepared by RF reactive magnetron sputtering. The deposited coatings were characterized by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), atomic force microscopy (AFM) and micro-indentation. [1] O.I.Yas’kiv, I. M.Pohrelyuk, M.V.Fedirko, R. V.Proskurnyak, Materials Science, Vol. 44, No. 3, (2008),352 [2] O.Knotek, F.Loffler, G.Kramer, Surf. Coat. Technol. 61 (1993) 320. [3] Y.Y.Guu, J.F.Lin, Wear 210 (1997) 245. [4] J.H.Hsieh, A.L.K .Tan, X.T Zeng, Surf. Coat. Technol. 201 (2006) 4094. [5] G.Baravian, G.Sultan, E.Damond, H.Detour, Surf. Coat. Technol. 76/77 (1995) 687. [6] E.Gergmann, H.Kaufmann, R.Schmid, Vogel J., Surf. Coat. Technol. 42 (1990) 237. [7] Y.H.Cheng, T.Browne, B.Heckerman, E.I.Meletis, Surf. Coat. Technol. 205 (2011) 4024.