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Electrochemical etching"
Ion implantation as a tool for controlling the morphology of porous gallium phosphide |
Tighineanu Ion12, Schwab Claude R.3, Grob Jean Jacques R.3, Prevot Bernard3, Hartnagel Hans Ludwig1, Vogt Alexander4, Irmer Gert5, Monecke Jochen5 |
1 Technical University Darmstadt, 2 Institute of Applied Physics, Academy of Sciences of Moldova, 3 PHASE laboratory, CNRS UPR No. 292, Strasbourg,
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Applied Physics Letters |
Nr. / 1997 / ISSN 0003-6951 /ISSNe 1077-3118 |
Disponibil online 16 June, 2023. Descarcări-0. Vizualizări-192 |
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