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Afisarea articolelor -19-0(1) pentru cuvîntul-cheie "Photoresist"
Both holographic and electron-beam recording in new carbazolyl - Containing photoresists
Andrieş Andrei1, Bivol Valeriu1, Ersoy Okan K.2, Robu Ştefan1, Sergheev Serghei1, Vlad Ludmila1
Proceedings of SPIE - The International Society for Optical Engineering
Ediţia 7, Vol.5581. 2004. Bellingham, Washington. ISSN 0277-786X.
Disponibil online 29 January, 2024. Descarcări-0. Vizualizări-154
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