Schottky barrier on the InGaAs/InP heterostructures grown by the Cl-VPE technique for photodetectors
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RUSU, Emil, BUDIANU, Elena, NAN, Stelian, PURICA, Munitzer. Schottky barrier on the InGaAs/InP heterostructures grown by the Cl-VPE technique for photodetectors. In: Proceedings of the International Semiconductor Conference: CAS, Ed. 19, 7-11 octombrie 1997, Sinaia. New Jersey: Institute of Electrical and Electronics Engineers Inc., 1996, Vol. 1, pp. 211-214. DOI: https://doi.org/10.1109/SMICND.1996.557344
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Proceedings of the International Semiconductor Conference
Vol. 1, 1996
Conferința "International Semiconductor Conference"
19, Sinaia, Romania, 7-11 octombrie 1997

Schottky barrier on the InGaAs/InP heterostructures grown by the Cl-VPE technique for photodetectors

DOI:https://doi.org/10.1109/SMICND.1996.557344

Pag. 211-214

Rusu Emil, Budianu Elena, Nan Stelian, Purica Munitzer
 
Institute of Applied Physics, Academy of Sciences of Moldova
 
 
Disponibil în IBN: 7 decembrie 2023


Rezumat

The Schottky barriers of Ag, Ti, Ni, on n and p iso-type heterostructures of In0.53Ga0.47 As/InP, grown by the Cl-VPE technique, have shown that values of 0.6 eV for Ag/p-InGaAs barrier height and of 0.46 eV on n-InGaAs, by growing an n-InP iterlayer may be obtained.

Cuvinte-cheie
Electrons, Epitaxial growth, Heterojunctions, Lattice vibrations, photodetectors, Semiconducting indium compounds, Semiconducting indium phosphide, Semiconductor doping, Vapor phase epitaxy