Sensing properties of tellurium based thin films to oxygen, nitrogen and water vapour
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TSIULYANU , Dumitru, STRATAN, Ion, TSIULYANU, A., EISELE, Ignatz. Sensing properties of tellurium based thin films to oxygen, nitrogen and water vapour. In: Proceedings of the International Semiconductor Conference: CAS, Ed. 29, 27-29 septembrie 2006, Sinaia. New Jersey: Institute of Electrical and Electronics Engineers Inc., 2006, Vol. 2, Ediția 29, pp. 287-290. ISBN 1424401097, 978-142440109-3. DOI: https://doi.org/10.1109/SMICND.2006.283999
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Proceedings of the International Semiconductor Conference
Vol. 2, Ediția 29, 2006
Conferința "29th International Semiconductor Conference"
29, Sinaia, Romania, 27-29 septembrie 2006

Sensing properties of tellurium based thin films to oxygen, nitrogen and water vapour

DOI:https://doi.org/10.1109/SMICND.2006.283999

Pag. 287-290

Tsiulyanu Dumitru1, Stratan Ion1, Tsiulyanu A.1, Eisele Ignatz2
 
1 Technical University of Moldova,
2 The Bundeswehr University Munich
 
 
Disponibil în IBN: 24 noiembrie 2023


Rezumat

Effect of O2, N2 and H2O to electrical behaviour of tellurium-based films has been studied at temperatures between 20 °C and 70 °C. The increase of oxygen partial pressure in N2 + O2 carrier gas results in a nearly linear decreasing of the film resistance. The complete impulsive substitution of nitrogen by oxygen decreases the resistance of the film with ∼ 6 % in 1.5 hours. The effect of humidity is more perceptible. At room temperature the resistance of the films increase with 15 % at 58 %RH, but humidity has a negligible effect at temperatures higher than 50 °C. The results suggest that effect of water vapour is due to simple physical adsorption, whereas effect of oxygen and nitrogen is the consequence of "week" chemisorption of these molecules on the film surface. 

Cuvinte-cheie
Atmospheric humidity, Electric properties, Nitrogen, oxygen, Tellurium, Thermal effects, Water vapor

Crossref XML Export

<?xml version='1.0' encoding='utf-8'?>
<doi_batch version='4.3.7' xmlns='http://www.crossref.org/schema/4.3.7' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xsi:schemaLocation='http://www.crossref.org/schema/4.3.7 http://www.crossref.org/schema/deposit/crossref4.3.7.xsd'>
<head>
<doi_batch_id>ibn-191118</doi_batch_id>
<timestamp>1719512055</timestamp>
<depositor>
<depositor_name>Information Society Development Instiute, Republic of Moldova</depositor_name>
<email_address>[email protected]</email_address>
</depositor>
</head>
<body>
<collection>
<collection_metadata>
<full_title>Proceedings of the International Semiconductor Conference</full_title>
</collection_metadata>
<collection_issue>
<publication_date media_type='print'>
<year>2006</year>
</publication_date>
<isbn>1424401097, 978-142440109-3</isbn>
</collection_issue>
<collection_article publication_type='full_text'><titles>
<title>Sensing properties of tellurium based thin films to oxygen, nitrogen and water vapour</title>
</titles>
<contributors>
<person_name sequence='first' contributor_role='author'>
<given_name>Dumitru</given_name>
<surname>Ţiuleanu</surname>
</person_name>
<person_name sequence='additional' contributor_role='author'>
<given_name>Ion</given_name>
<surname>Stratan</surname>
</person_name>
<person_name sequence='additional' contributor_role='author'>
<given_name>A</given_name>
<surname>Tiuleanu</surname>
</person_name>
<person_name sequence='additional' contributor_role='author'>
<given_name>Ignatz</given_name>
<surname>Eisele</surname>
</person_name>
</contributors>
<publication_date media_type='print'>
<year>2006</year>
</publication_date>
<pages>
<first_page>287</first_page>
<last_page>290</last_page>
</pages>
<doi_data>
<doi>10.1109/SMICND.2006.283999</doi>
<resource>http://www.crossref.org/</resource>
</doi_data>
</collection_article>
</collection>
</body>
</doi_batch>