| Conţinutul numărului revistei |
| Articolul precedent |
| Articolul urmator |
 147 0 |
| Căutarea după subiecte similare conform CZU |
| 621.38+538.9 (2) |
| Electrotehnică (1161) |
| Fizica materiei condensate. Fizica solidului (349) |
 SM ISO690:2012SERGEEV, Sergei, YOVU, M., ENACHI, Mihail. Binary superimposed gratings formed by e-beam recording in amorphous AsS films. In: Journal of Nanoelectronics and Optoelectronics, 2014, vol. 9, pp. 291-294. ISSN 1555-130X. DOI: https://doi.org/10.1166/jno.2014.1583 |
| EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
  Journal of Nanoelectronics and Optoelectronics |
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| Volumul 9 / 2014 / ISSN 1555-130X | |||||||
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| DOI:https://doi.org/10.1166/jno.2014.1583 | |||||||
| CZU: 621.38+538.9 | |||||||
| Pag. 291-294 | |||||||
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| Rezumat | |||||||
Binary unidirectional superimposed diffraction gratings with grating periods of 0.9 μm and 1 μm were formed in amorphous AsS films by e-beam recording. The influence of recording sequence of index superimposed gratings on their diffraction efficiency was evidenced. Enhancement of diffraction efficiencies of index superimposed gratings as compared to single gratings was revealed. Relief structures of superimposed gratings were fabricated by chemical etching. The surface relief modulation was studied by atomic force microscope. A beat period of 9 μm for relief complex structure was observed. The highest depth of relief modulation was about 70-80 μm |
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| Cuvinte-cheie diffraction efficiency, e-beam recording, Relief Structure, Superimposed Gratings |
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