Effect of p-NiO interlayer on internal quantum efficiency of p-GaN/n-ZnO light-emitting devices
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Electromagnetism. Câmp electromagnetic. Electrodinamică (61)
Electrotehnică (1161)
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SIRKELI, Vadim, YILMAZOGLU, Oktay, KUPPERS, Franko, HARTNAGEL, Hans Ludwig. Effect of p-NiO interlayer on internal quantum efficiency of p-GaN/n-ZnO light-emitting devices. In: Journal of Nanoelectronics and Optoelectronics, 2015, vol. 9, pp. 811-818. ISSN 1555-130X. DOI: https://doi.org/10.1166/jno.2014.1687
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Journal of Nanoelectronics and Optoelectronics
Volumul 9 / 2015 / ISSN 1555-130X

Effect of p-NiO interlayer on internal quantum efficiency of p-GaN/n-ZnO light-emitting devices

DOI:https://doi.org/10.1166/jno.2014.1687
CZU: 537.86+621.38

Pag. 811-818

Sirkeli Vadim123, Yilmazoglu Oktay1, Kuppers Franko1, Hartnagel Hans Ludwig1
 
1 Technical University Darmstadt,
2 Moldova State University,
3 Comrat State University
 
 
Disponibil în IBN: 17 mai 2023


Rezumat

We report on numerical investigations of p-GaN/n-ZnO light-emitting devices with p-NiO interlayer, and on LED design optimization which includes bandgap engineering, thickness and doping of constituent layers. The current-voltage dependences of investigated LEDs show a threshold voltage of 3.1 V and 5.4 V for the LED devices without and with presence of p-NiO interlayer, respectively. It is found that p-NiO layer act as electron blocking layer, that lead to the enhance of charge carriers confinement in active region, and to the increasing of internal quantum efficiency (IQE) of LED device up to 0.5%, that in four times higher in compare with that for original p-GaN/n-ZnO LED device.

Cuvinte-cheie
Gallium nitride, internal quantum efficiency, light-emitting diode, nickel oxide, Zinc