Divizarea tensiunii de prag Vth în componentele Vot şi Vit
Închide
Conţinutul numărului revistei
Articolul precedent
Articolul urmator
807 2
Ultima descărcare din IBN:
2021-11-27 14:19
Căutarea după subiecte
similare conform CZU
621.382.027 (1)
Electrotehnică (1163)
SM ISO690:2012
RUSANOVSCHI, Vitalie. Divizarea tensiunii de prag Vth în componentele Vot şi Vit. In: Intellectus, 2003, nr. 2, pp. 71-73. ISSN 1810-7079.
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Intellectus
Numărul 2 / 2003 / ISSN 1810-7079 /ISSNe 1810-7087

Divizarea tensiunii de prag Vth în componentele Vot şi Vit
CZU: 621.382.027

Pag. 71-73

Rusanovschi Vitalie
 
Agentia de Stat pentru Proprietatea Intelectuala a Republicii Moldova (AGEPI)
 
 
Disponibil în IBN: 30 noiembrie 2013


Rezumat

T he irradiation of transistors semiconductor-oxide-metal determines the significant modification of electrophisics characteristics, including characteristics Volt-Ampere (CVA). The CVA variation of TMOS takes part at the irradiation as a result of modification of threshold voltage shift at the accumulation of positive charge Qot in the volume of dielectrique and charge Qit on surface states (SS). In this work the method is presented that allows the determining of charge in volume and at the dielectrique surface. The method can be utilized in the researching of different external actions (the influence of the temperature, ionized radiation)

Cerif XML Export

<?xml version='1.0' encoding='utf-8'?>
<CERIF xmlns='urn:xmlns:org:eurocris:cerif-1.5-1' xsi:schemaLocation='urn:xmlns:org:eurocris:cerif-1.5-1 http://www.eurocris.org/Uploads/Web%20pages/CERIF-1.5/CERIF_1.5_1.xsd' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' release='1.5' date='2012-10-07' sourceDatabase='Output Profile'>
<cfResPubl>
<cfResPublId>ibn-ResPubl-14545</cfResPublId>
<cfResPublDate>2003-06-02</cfResPublDate>
<cfIssue>2</cfIssue>
<cfStartPage>71</cfStartPage>
<cfISSN>1810-7079</cfISSN>
<cfURI>https://ibn.idsi.md/ro/vizualizare_articol/14545</cfURI>
<cfTitle cfLangCode='RO' cfTrans='o'>Divizarea tensiunii de prag Vth în componentele Vot şi Vit</cfTitle>
<cfAbstr cfLangCode='EN' cfTrans='o'>T he irradiation of transistors semiconductor-oxide-metal determines the significant modification
of electrophisics characteristics, including characteristics Volt-Ampere (CVA). The CVA variation
of TMOS takes part at the irradiation as a result of modification of threshold voltage shift at the
accumulation of positive charge Qot in the volume of dielectrique and charge Qit on surface states (SS).
In this work the method is presented that allows the determining of charge in volume and at the
dielectrique surface. The method can be utilized in the researching of different external actions (the
influence of the temperature, ionized radiation)</cfAbstr>
<cfResPubl_Class>
<cfClassId>eda2d9e9-34c5-11e1-b86c-0800200c9a66</cfClassId>
<cfClassSchemeId>759af938-34ae-11e1-b86c-0800200c9a66</cfClassSchemeId>
<cfStartDate>2003-06-02T24:00:00</cfStartDate>
</cfResPubl_Class>
<cfResPubl_Class>
<cfClassId>e601872f-4b7e-4d88-929f-7df027b226c9</cfClassId>
<cfClassSchemeId>40e90e2f-446d-460a-98e5-5dce57550c48</cfClassSchemeId>
<cfStartDate>2003-06-02T24:00:00</cfStartDate>
</cfResPubl_Class>
<cfPers_ResPubl>
<cfPersId>ibn-person-14351</cfPersId>
<cfClassId>49815870-1cfe-11e1-8bc2-0800200c9a66</cfClassId>
<cfClassSchemeId>b7135ad0-1d00-11e1-8bc2-0800200c9a66</cfClassSchemeId>
<cfStartDate>2003-06-02T24:00:00</cfStartDate>
</cfPers_ResPubl>
</cfResPubl>
<cfPers>
<cfPersId>ibn-Pers-14351</cfPersId>
<cfPersName_Pers>
<cfPersNameId>ibn-PersName-14351-2</cfPersNameId>
<cfClassId>55f90543-d631-42eb-8d47-d8d9266cbb26</cfClassId>
<cfClassSchemeId>7375609d-cfa6-45ce-a803-75de69abe21f</cfClassSchemeId>
<cfStartDate>2003-06-02T24:00:00</cfStartDate>
<cfFamilyNames>Rusanovschi</cfFamilyNames>
<cfFirstNames>Vitalie</cfFirstNames>
</cfPersName_Pers>
</cfPers>
</CERIF>