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SM ISO690:2012 JAFAROVA, E., SADYGOV, Z., DOVLATOV, A., ALIYEVA, L., TAPDYGOV, E.. Inductive type impedance of high sensitivity silicon avalanche photodiodes with deeply buried micropixels. In: Materials Science and Condensed Matter Physics, Ed. 8-th Edition, 12-16 septembrie 2016, Chişinău. Chişinău: Institutul de Fizică Aplicată, 2016, Editia 8, p. 272. ISBN 978-9975-9787-1-2. |
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Materials Science and Condensed Matter Physics Editia 8, 2016 |
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Conferința "International Conference on Materials Science and Condensed Matter Physics" 8-th Edition, Chişinău, Moldova, 12-16 septembrie 2016 | ||||||
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Pag. 272-272 | ||||||
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Over the past decades developed new micro-pixel avalanche photodiodes (MAPD) have had wide application as an effective alternative to vacuum photomultiplier. They are compact, have a low voltage (100 V), high quantum yield (~ 90%) and low cost. These photodiodes are used for the creation of instruments for scientific research and equipments in the medical and nuclear physics [1,2]. MAPD design consists of n-Si substrate, on which two p-type epitaxial layers are grown. Between these layers the structure contains a matrix of 2-5 microns individual n+-p junctions (deeply buried pixels) [1,3]. Thereby the structure obtained by above mentioned technology has three p-n junctions at all cross sections passing through the pixels: n+-p, p-n+pix, n+pix-p. In operating mode positive potential is applied to the n-substrate and by this way achieves completely depletion of both p type layers. In these conditions pixels have no charge coupling. |
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