Evidence for the concentration induced extinction of gas sensitivity in amorphous and nanostructured Te thin films

Tsiulyanu  Dumitru; Mocreac Olga; Enachi Mihail; Volodina Galina

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TSIULYANU , Dumitru, MOCREAC, Olga, ENACHI, Mihail, VOLODINA, Galina. Evidence for the concentration induced extinction of gas sensitivity in amorphous and nanostructured Te thin films. In: Nanotechnologies and Biomedical Engineering, Ed. 2, 18-20 aprilie 2013, Chișinău. Technical University of Moldova, 2013, Editia 2, pp. 222-226. ISBN 978-9975-62-343-8..

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Nanotechnologies and Biomedical Engineering
Editia 2, 2013

Conferința "International Conference on Nanotechnologies and Biomedical Engineering"
2, Chișinău, Moldova, 18-20 aprilie 2013

Evidence for the concentration induced extinction of gas sensitivity in amorphous and nanostructured Te thin films

Pag. 222-226

Tsiulyanu Dumitru¹, Mocreac Olga¹, Enachi Mihail¹, Volodina Galina²

¹ Technical University of Moldova,
² Institute of Applied Physics, Academy of Sciences of Moldova

Proiecte:

Menționat în lucrare: 11.817.05.21A Electrodepozite nanometrice în calcogenuri superionice cuaternare pentru aplicare în elemente cu memorie nevolatilă

Disponibil în IBN: 18 iunie 2019

Rezumat

The extinction of sensitivity to nitrogen dioxide induced by high gas concentration have been observed in ultrathin tellurium films. The phenomenon becomes apparent in both continuous and nanostructured films shown by AFM, SEM and XRD analyses to be in amorphous state. Sensitivity of 30 nm thickness Te film decreases near linearly with concentration increase between 150 and 500 ppb of nitrogen dioxide. The results are explained in terms of formation of a nitrogen dioxide catalytic gate in which a molecule adsorbs (and desorbs) without reacting.

Cuvinte-cheie
Gas sensitivity, Extinction, Nanostructured tellurium, NO2.