Oxygen-dependent formation of VO2 thin films by metalorganic aerosol deposition
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2023-06-04 07:34
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BELENCHUK, Alexandr, SHAPOVAL, Oleg M., ZASAVITSKY, E., VATAVU, Sergiu, KIRITSA, Arcady. Oxygen-dependent formation of VO2 thin films by metalorganic aerosol deposition. In: Telecommunications, Electronics and Informatics, Ed. 6, 24-27 mai 2018, Chișinău. Chișinău, Republica Moldova: 2018, Ed. 6, pp. 115-118. ISBN 978-9975-45-540-4.
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Telecommunications, Electronics and Informatics
Ed. 6, 2018
Conferința "Telecommunications, Electronics and Informatics"
6, Chișinău, Moldova, 24-27 mai 2018

Oxygen-dependent formation of VO2 thin films by metalorganic aerosol deposition


Pag. 115-118

Belenchuk Alexandr1, Shapoval Oleg M.1, Zasavitsky E.1, Vatavu Sergiu2, Kiritsa Arcady2
 
1 Institute of the Electronic Engineering and Nanotechnologies "D. Ghitu" of the Academy of Sciences of Moldova,
2 Moldova State University
 
Disponibil în IBN: 29 mai 2018


Rezumat

We report on the growth and properties of vanadium dioxide (VO2) on amorphous and oriented substrates by the low-cost and industry-oriented method of metalorganic aerosol deposition (MAD). X-ray diffraction and temperaturedependent Raman spectroscopy confirm formation of single phase tin films. Abrupt change of resistance by 5×103 times and steep drop of infrared transmission from 49 to 10% at 1700 nm pave the way for application of MAD technique in fabrication of VO2-based optoelectronic and thermochromic devices, such as “smart windows”.

Cuvinte-cheie
VO2 thin films, resistance switching,

Metalorganic aerosol deposition, surface morphology, crystal structure, Raman spectroscopy, optical transmittance