NNN 9 P Planar nanostructures fabrication. By UV-nanosecond laser interference lithography
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MUSORIN, A., CHETVERTUKHIN, A., DRYNKINA, E., DOLGOVA, T., FEDYANIN, A.. NNN 9 P Planar nanostructures fabrication. By UV-nanosecond laser interference lithography. In: Materials Science and Condensed Matter Physics, 13-17 septembrie 2010, Chișinău. Chișinău, Republica Moldova: Institutul de Fizică Aplicată, 2010, Editia 5, p. 205.
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Materials Science and Condensed Matter Physics
Editia 5, 2010
Conferința "Materials Science and Condensed Matter Physics"
Chișinău, Moldova, 13-17 septembrie 2010

NNN 9 P Planar nanostructures fabrication. By UV-nanosecond laser interference lithography


Pag. 205-205

Musorin A., Chetvertukhin A., Drynkina E., Dolgova T., Fedyanin A.
 
Lomonosov Moscow State University
 
Disponibil în IBN: 21 aprilie 2021


Rezumat

ePlanar nanostructures fabrication such as subwavelength diffraction gratings is reported. Subwavelength metal diffraction gratings can be used for coupling of incident laser beam into the planar waveguide. This technique is efficient due to ability of effective energy transfer from radiation to waveguide mode. A grating may be located in any metal part of studied waveguide. Subwavelength gratings are attractive because they decrease amount of diffraction maxima and thus increase coupling efficiency. For planar nanostructures fabrication, a UV nanosecond laser interference lithography (LIL) was used. It allows us to fabricate a large periodical nanostructures with size of 1-2 cm2 with period of 400-700 of nm. Nanosecond pulsed laser with optical parametric oscillator (OPO) block used as LIL source gives us way to control period of interference pattern smoothly by changing incident beam wavelength without changes in interferometer pattern smoothly by changing incident beam wavelength without changes in interferometer scheme. Main parts of experimental setup are UV laser source described below, and Lloyd interferometer to produce a periodical interference pattern at the sample surface.figureFigure 1: LIL setup scheme.The laser radiation of the tripledfrequency Nd3+:YAG laser (λ=355 nm) with repetition rate of 10 Hz and pulse energy up to 100 mJ follows through spatial filter and beam expander and reaches Lloyd-interferometer where sample is placed. The sketch of Lloyd interferometer used in the work is shown in Figure 1. Sample S is placed perpendicularly to mirror M, incident beam is divided into two beams signed as A and B.One of them goes directly to the sample, the other one is reflected from mirror M and then goes to the sample. Thus reflected beam interferes with incident beam and produce an interference pattern at the sample surface covered with thin layer of photoresist. The suitable photoresist is necessary to be stable yet to mixture of KI + I2, used for further etching of gold. When the sample is illuminated by interference pattern, photoresist is exposed in places where inference maxima is localized. After exposition the sample is placed to developer, unexposed areas of photoresist are removed and a contrast diffraction grating is obtained. After that gold film on top of planar waveguide can be etched through mask of exposed resist and forms subwavelength diffraction grating. Changing of the angle of incidence leads to variation of grating period. Lloyd-interferometer is covered by black box with UV filtered aperture for defend it from any noise radiation. Using of obtained photoresist mask allows to produce planar periodical nanostructures by chemical or dry etching method or lift-off process. Dependence of lattice spacing from angle of incidence was obtained. Data received by experiment are in good agreement with calculations.