Titanium oxide is widely used as photoactive semiconductor for solar energy conversion into electricity [1] or chemical energy [2]. The most commonly used methods of obtaining titanium oxide surfaces consist in anodizing of titanium surfaces in hydrofluoric acid based electrolytes [3]. In the present paper is presented a new efficient method of obtaining of TiO2 semiconductor surfaces. It consists in titanium plate anodizing in aqueous solution mixture of acids H2SO4/HCl at varied voltages. As result was obtained amorphous TiO2 surface, wich was annealed at 400 °C for 1 h to get the anatase form (determined using X-ray powder diffraction). The morphology of the nanoporous titanium dioxide was investigated by use of scanning electron microscope (VEGA TS 5130, UTM) (Fig.1). The obtained images show a porous surface structure. Pore size varies between 50 and 100 nm. The photoactivity of obtained surfaces was demonstrated by organic compounds degradation under UV radiation. The variation in time of UV-VIS absorbing spectra and molar concentration of etalon organic compound are presented in figures 2 and 3. It was calculated that one square centimetre of TiO2 surface photocatalytic degrade 1.85*10-5 mol/h of etalon compound.figureFig. 1. The SEM image of titanium dioxide surface.figureFig. 2. UV-VIS spectra of degraded organic compound.figureFig. 3. The curve of decrease in time of organic compound molar concentration.