Articolul precedent |
Articolul urmator |
612 0 |
SM ISO690:2012 DOROGAN, Valerian, VIERU, Tatiana, VIERU, Stanislav, DOROGAN, Andrei. Photoelectric properties of nanostuctured layers. In: Nanotechnologies and Biomedical Engineering, Ed. 2, 18-20 aprilie 2013, Chișinău. Technical University of Moldova, 2013, Editia 2, pp. 115-119. ISBN 978-9975-62-343-8.. |
EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
Nanotechnologies and Biomedical Engineering Editia 2, 2013 |
||||||
Conferința "International Conference on Nanotechnologies and Biomedical Engineering" 2, Chișinău, Moldova, 18-20 aprilie 2013 | ||||||
|
||||||
Pag. 115-119 | ||||||
|
||||||
Rezumat | ||||||
The paper is focused to study the photosensitivity modulation in crystalline and nanostructured materials. The photoresistor with modulated photosensitivity on the basis of III-V compounds was elaborated. In the results of investigation the photoresistor characteristics and the physical model to modulate photosensitivity are presented. Nanostructured films were formed by selective photo-assisted electro-chemical etching of the nGaP and n-InP substrate and were separated from it by wet chemical etching. Researches of photoelectric characteristics of nanostructured films are presented, modeled and discussed. Photoelectric properties of nanostructured layers make it possible to use such structures for the manufacture of optical detectors and switches. |
||||||
Cuvinte-cheie nanostructured layer, photoconductivity, photoresistor, porous film |
||||||
|
DataCite XML Export
<?xml version='1.0' encoding='utf-8'?> <resource xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xmlns='http://datacite.org/schema/kernel-3' xsi:schemaLocation='http://datacite.org/schema/kernel-3 http://schema.datacite.org/meta/kernel-3/metadata.xsd'> <creators> <creator> <creatorName>Dorogan, V.V.</creatorName> <affiliation>Universitatea Tehnică a Moldovei, Moldova, Republica</affiliation> </creator> <creator> <creatorName>Vieru, T.S.</creatorName> <affiliation>Universitatea Tehnică a Moldovei, Moldova, Republica</affiliation> </creator> <creator> <creatorName>Vieru, S.F.</creatorName> <affiliation>Universitatea Tehnică a Moldovei, Moldova, Republica</affiliation> </creator> <creator> <creatorName>Dorogan, A.V.</creatorName> <affiliation>Universitatea Tehnică a Moldovei, Moldova, Republica</affiliation> </creator> </creators> <titles> <title xml:lang='en'>Photoelectric properties of nanostuctured layers</title> </titles> <publisher>Instrumentul Bibliometric National</publisher> <publicationYear>2013</publicationYear> <relatedIdentifier relatedIdentifierType='ISBN' relationType='IsPartOf'>978-9975-62-343-8.</relatedIdentifier> <subjects> <subject>nanostructured layer</subject> <subject>photoconductivity</subject> <subject>photoresistor</subject> <subject>porous film</subject> </subjects> <dates> <date dateType='Issued'>2013</date> </dates> <resourceType resourceTypeGeneral='Text'>Conference Paper</resourceType> <descriptions> <description xml:lang='en' descriptionType='Abstract'><p>The paper is focused to study the photosensitivity modulation in crystalline and nanostructured materials. The photoresistor with modulated photosensitivity on the basis of III-V compounds was elaborated. In the results of investigation the photoresistor characteristics and the physical model to modulate photosensitivity are presented. Nanostructured films were formed by selective photo-assisted electro-chemical etching of the nGaP and n-InP substrate and were separated from it by wet chemical etching. Researches of photoelectric characteristics of nanostructured films are presented, modeled and discussed. Photoelectric properties of nanostructured layers make it possible to use such structures for the manufacture of optical detectors and switches.</p></description> </descriptions> <formats> <format>application/pdf</format> </formats> </resource>