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SM ISO690:2012 MONAICO, Eduard, BRINCOVEANU, Oana, MESTERCA, Raluca, URSACHI, Veaceslav, PRODANA, Mariana, ENACHESCU, Marius, TIGINYANU, Ion. Pulsed Electroplating of Metal Nanoparticles form DODUCO Electrolytes . In: Microelectronics and Computer Science, Ed. 9, 19-21 octombrie 2017, Chisinau. Chișinău, Republica Moldova: Universitatea Tehnică a Moldovei, 2017, Ediția 9, pp. 16-20. ISBN 978-9975-4264-8-0. |
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Microelectronics and Computer Science Ediția 9, 2017 |
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Conferința "Microelectronics and Computer Science" 9, Chisinau, Moldova, 19-21 octombrie 2017 | |
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Pag. 16-20 | |
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The mechanisms of Au deposition on InP porous substrates during a pulsed electroplating process are investigated by means of Topography imaging and Current Mapping measurements. The obtained results confirm the formation of Schottky barriers at the interface of the semiconductor substrate with Au nanoparticles with diameters around 20 nm, and corroborate the hypothesis that the mechanism of Au nanoparticles self-assembling into monolayers is governed by the formation of such Schottky barriers. The analysis of current-voltage curves suggest also the deposition of a dielectric film over the larger Au particles produced with long duration pulsed electroplating from DODUCO solutions. |
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Cuvinte-cheie Semiconductor substrate, Atomic force topography, Current mapping, electroplating |
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