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Afisarea articolelor 1-2(2) pentru cuvîntul-cheie "Atomic layer deposition"

Ultra-thin TiO2 films by atomic layer deposition and surface functionalization with Au nanodots for sensing applications

Lupan Oleg12, Postica Vasilie2, Ababii Nicolai2, Reimer Tim34, Shree Sindu1, Hoppe Mathias1, Polonskyi Oleksandr1, Şontea Victor2, Chemnitz Steffen4, Faupel Franz1, Adelung Rainer1
1 Institute for Material Science, Christian-Albrechts- University of Kiel,
2 Technical University of Moldova,
3 Fraunhofer Institute for Silicon Technologies (ISIT),
4 Institute for Electrical Engineering University of Kiel
Materials Science in Semiconductor Processing
Nr. 87 / 2018 / ISSN 1369-8001
Disponibil online 7 August, 2018. Descarcări-8. Vizualizări-301
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Magneto-ionic control of magnetism in two-oxide nanocomposite thin films comprising mesoporous cobalt ferrite conformally nanocoated with HfO2

Robbennolt Shauna1, Yu Pengmei2, Sort Jordi13, Mercier Fernandez Pau1, Coll Marionna2, Nicolenco Aliona14
1 Universitat Autònoma de Barcelona,
2 Institute of Materials Science of Barcelona,
3 Institució Catalana de Recerca i Estudis Avançats (ICREA),
4 Institute of Applied Physics
Nanoscale
Nr. 10(12) / 2020 / ISSN 2040-3364 /ISSNe 2040-3372
Disponibil online 5 April, 2020. Descarcări-0. Vizualizări-65
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