NNN 28 P Investigation of corona discharge influence on the formation of holographic gratings in metal - chalcogenide vitreous semiconductor structures
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NASTAS, Andrian, TRIDUKH, Ghennadi, PRISAKAR, Alexandr, MESHALKIN, Alexei. NNN 28 P Investigation of corona discharge influence on the formation of holographic gratings in metal - chalcogenide vitreous semiconductor structures. In: Materials Science and Condensed Matter Physics, Ed. 6, 11-14 septembrie 2012, Chișinău. Chișinău, Republica Moldova: Institutul de Fizică Aplicată, 2012, Editia 6, p. 237. ISBN 978-9975-66-290-1.
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Materials Science and Condensed Matter Physics
Editia 6, 2012
Conferința "Materials Science and Condensed Matter Physics"
6, Chișinău, Moldova, 11-14 septembrie 2012

NNN 28 P Investigation of corona discharge influence on the formation of holographic gratings in metal - chalcogenide vitreous semiconductor structures


Pag. 237-237

Nastas Andrian, Tridukh Ghennadi, Prisakar Alexandr, Meshalkin Alexei
 
Institute of Applied Physics
 
Disponibil în IBN: 25 martie 2020


Rezumat

Chalcogenide vitreous semiconductors (ChVS) have found wide applications in the systems of registration, storage and processing of the optical information [1]. Recording of optical information in thin films of ChVS bases on a variety of physical processes [2]. To create high-quality diffractive optical elements, the master hologram, nanostructures and photonic crystals the recording methods based on photo-structural transformations and photo-diffusion metals in thin films of ChVS are the most promising ways. However, they possess a number of basic shortcomings: low values of sensitivity and low values of diffraction efficiency [2]. The aim of this study was to investigate the possibility of holographic sensitivity and diffraction efficiency increasing by corona discharge application during the recording of holographic gratings in metal - ChVS structures. As a result of the preliminary analysis for optimization the structures Ni-As2S3 and Cu-As2Se3 were selected. The holographic recording based on photo-structural transformanions was carried out in Ni-As2S3 structure, and the recording based on Cu photo-diffusion in Cu-As2Se3 structure. For both cases the holographic recording were carried out in the presence and absence of a corona discharge. It was established that application of corona discharge during the holographic recording leads to increasing of holographic sensitivity, diffraction efficiency, dynamic range and contrast by several times [3-5]. It is shown that application of corona discharge during the holographic recording of gratings lead to increasing of relief depth of phase holographic gratings selective etching of holographic gratings the diffraction efficiency in the samples and to diffraction efficiency increasing [5]. The experimental data confirm that the elaborated method of the application of corona discharge during the holographic recording makes possible the improving of holographic image parameters and diffractive optical elements based on ChVS, which is important for future applications in various optoelectronic measurements and holographic systems.