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SM ISO690:2012 KNAP, Wojciech , BUT, D., COQUILLAT, D., DIAKONOVA, N., TEPPE, Fréd́eric. III-V versus silicon choice of nanometer field effect transistors for THZ applications. In: Materials Science and Condensed Matter Physics, Ed. 6, 11-14 septembrie 2012, Chișinău. Chișinău, Republica Moldova: Institutul de Fizică Aplicată, 2012, Editia 6, p. 29. ISBN 978-9975-66-290-1. |
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Materials Science and Condensed Matter Physics Editia 6, 2012 |
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Conferința "Materials Science and Condensed Matter Physics" 6, Chișinău, Moldova, 11-14 septembrie 2012 | ||||||
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Pag. 29-29 | ||||||
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This is an overview of the main physical ideas and experimental results concerning the application of field effect transistors for the generation and detection of TeraHertz ( THz) radiation. Resonant frequencies of the two-dimensional plasma oscillations in FETs increase with the reduction of the channel dimensions and reach the THz range for sub-micron gate lengths. When the mobility is high enough, the dynamics of a short channel FET is dominated by plasma waves. This may result, on the one hand, in a spontaneous generation of THz frequencies by a dc current and on the other hand, in a resonant response to imaging.incoming THz radiation. In other cases , when plasma oscillations are over damped, or are generated on the gate edges the FET can operate as an efficient broadband THz emitters and detectors and can be used for |
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